The black silicon method. IV. The fabrication of three-dimensional structures in silicon with high apect ratios for scanning probe microscopy and other applications

H. Jansen, M. D. de Boer, B. Otter, M. Elwenspoek
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引用次数: 43

Abstract

The recently developed black silicon method (BSM) is presented as a powerful tool in finding recipes for the fabrication of MEMS building blocks such as Ay-stages. scanning probe tips, inkjet filters, multi-electrodes for neuro-electronic interfaces, and mouldings Lor direct patterning into polymers. The fabrication of these blocks in silicon with high aspect ratios and smooth surface textures will be described and discussed by using the BSM and standard reactive ion etching (ME).
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黑硅法。四、在硅中制造具有高纵横比的三维结构,用于扫描探针显微镜和其他应用
最近开发的黑硅方法(BSM)是一种强大的工具,用于寻找制造MEMS构建块(如ay -stage)的配方。扫描探针尖端,喷墨过滤器,用于神经电子接口的多电极,以及将Lor直接图案塑造成聚合物。本文将描述和讨论利用BSM和标准反应离子蚀刻(ME)在硅中制备具有高纵横比和光滑表面结构的这些块的方法。
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