{"title":"Quartz crystal microbalance humidity sensor with porous electrodes","authors":"K. Galatsis, W. Qu, W. Wlodarski","doi":"10.1109/COMMAD.1998.791666","DOIUrl":null,"url":null,"abstract":"This short paper describes a new idea for humidity measurement using QCM (Quartz Crystal Microbalance) devices. It is based on an etching approach which produces micropores into the electrodes of a QCM, instead of the common approach of coating the electrodes with hygroscopic materials. The electrodes are etched wet-chemically using buffered king water (NHO/sub 3/:HCl=1:3). The electrode surface becomes rough, resulting in a large surface area for water adsorption. Photolithographic etching using a plasma will be the next research stage, this will eliminate the generation of a randomly dented surface, hence providing a uniform porous structure. Fabrication and results of preliminary measurement are described in this paper.","PeriodicalId":300064,"journal":{"name":"1998 Conference on Optoelectronic and Microelectronic Materials and Devices. Proceedings (Cat. No.98EX140)","volume":"4 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1998-12-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"9","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"1998 Conference on Optoelectronic and Microelectronic Materials and Devices. Proceedings (Cat. No.98EX140)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/COMMAD.1998.791666","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 9
Abstract
This short paper describes a new idea for humidity measurement using QCM (Quartz Crystal Microbalance) devices. It is based on an etching approach which produces micropores into the electrodes of a QCM, instead of the common approach of coating the electrodes with hygroscopic materials. The electrodes are etched wet-chemically using buffered king water (NHO/sub 3/:HCl=1:3). The electrode surface becomes rough, resulting in a large surface area for water adsorption. Photolithographic etching using a plasma will be the next research stage, this will eliminate the generation of a randomly dented surface, hence providing a uniform porous structure. Fabrication and results of preliminary measurement are described in this paper.