Lateral HV-MOS transistors (50V) for integration in a 0.18μm CMOS-process

M. Gross, M. Stoisiek, T. Uhlig, C. Ellmers, F. Furnhammer
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引用次数: 2

Abstract

DS(on) *A = 36.2 mQmm2 at a breakdown voltage of 60 V. The integration of the devices in the CMOS base process uses five additional photo masks.
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横向HV-MOS晶体管(50V)集成在0.18μm cmos工艺
在击穿电压为60v时,DS(on) *A = 36.2 mQmm2。在CMOS基制程中集成器件使用了五个额外的光掩模。
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