Annealing characteristics of native defects in low-temperature-grown MBE GaAs

J. Darmo, F. Dubecký, P. Kordos, A. Forster
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引用次数: 1

Abstract

Deep-level states in low-temperature-grown MBE GaAs are analyzed from the viewpoint of thermal stability. Gallium vacancy V/sub Ga/-related states have two annealing stages with the on-set temperature at about 310 and 430/spl deg/C. Low temperature stage is connected with mobile arsenic interstitial A/sub Si/, while an interaction between V/sub Ga/ and arsenic antiside As/sub Ga/ is dominant in the later stage. Essential annealing kinetic characteristics were determined for both stages. Finally, the migration enthalpy for As/sub Ga/ and the formation enthalpy of annealing of the EL6 state were estimated.
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低温生长MBE GaAs中原生缺陷的退火特性
从热稳定性的角度分析了低温生长MBE GaAs的深能级态。镓空位V/亚Ga/相关态有两个退火阶段,开机温度分别为310和430℃。低温阶段与砷的移动间隙A/sub Si/有关,而后期以V/sub Ga/与砷的反侧体As/sub Ga/相互作用为主。确定了两个阶段的基本退火动力学特性。最后,估计了As/sub Ga/的迁移焓和EL6态退火的形成焓。
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