{"title":"Thermal analysis of ultra-thin body device scaling [SOI and FinFet devices]","authors":"E. Pop, R. Dutton, K. Goodson","doi":"10.1109/IEDM.2003.1269420","DOIUrl":null,"url":null,"abstract":"This paper explores the effect of confined dimensions and complicated geometries on the self-heating of ultra-thin body SOI and FinFET devices. A compact thermal model is introduced, incorporating the most advanced understanding of nanoscale heat conduction available. Novel device scaling is analyzed from a thermal point of view. We show device temperatures are very sensitive to the choice of drain and channel extension dimensions, and suggest a parameter design space which can help alleviate thermal problems. ITRS power guidelines below the 25 nm technology node should be revised if isothermal scaling of thin-body devices is desired.","PeriodicalId":344286,"journal":{"name":"IEEE International Electron Devices Meeting 2003","volume":"108 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2003-12-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"83","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE International Electron Devices Meeting 2003","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IEDM.2003.1269420","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 83
Abstract
This paper explores the effect of confined dimensions and complicated geometries on the self-heating of ultra-thin body SOI and FinFET devices. A compact thermal model is introduced, incorporating the most advanced understanding of nanoscale heat conduction available. Novel device scaling is analyzed from a thermal point of view. We show device temperatures are very sensitive to the choice of drain and channel extension dimensions, and suggest a parameter design space which can help alleviate thermal problems. ITRS power guidelines below the 25 nm technology node should be revised if isothermal scaling of thin-body devices is desired.