Optimizing antenna voltage balancing for remote helical ICP plasma discharge using Oxygen, Hydrogen, Nitrogen, Ammonia and their mixtures : AEPM: Advanced Equipment Processes and Materials

2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) Pub Date : 2019-05-01 DOI:10.1109/ASMC.2019.8791803
S. J. Yoon, Jongwoo Park, A. Kim
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Abstract

Inductively coupled plasma technology is widely used for photoresist strip processes in the modern semiconductor industry. We examined plasma discharge behavior according to various gas mixtures and end capacitance values. Antenna voltage and plasma impedance were measured during plasma discharge. Plasma harmonic was experimentally compared by adjusting the antenna balance. We report the experimental results which reveal that the changes in antenna voltage is associated with the applied gases and their mixing ratio.
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利用氧、氢、氮、氨及其混合物优化远程螺旋ICP等离子体放电天线电压平衡:AEPM:先进设备工艺和材料
电感耦合等离子体技术在现代半导体工业中广泛应用于光刻胶带工艺。我们根据不同的气体混合物和端电容值检测了等离子体的放电行为。测量了等离子体放电过程中天线电压和等离子体阻抗。通过调整天线平衡，对等离子体谐波进行了实验比较。实验结果表明，天线电压的变化与外加气体及其混合比有关。
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2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
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