M. Schlipf, G. Lohr, K. Hintzer, J. Abate, R. Spell
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引用次数: 0
Abstract
Polytetrafluoroethylene (PTFE) and per-fluorinated fluorothermoplastics such as PFA, a copolymer of tetrafluoroethylene with some 4 wt% perfluoroalkylvinylether, have become materials of choice in semiconductor manufacturing machinery for critical chemical and gas interface components. Hostaflon TFM, the 2nd generation PTFE, complements PFA in semiconductor applications in a way that cannot be achieved by non-modified PTFE. This paper identifies the benefits in contamination control and reliability of Hostaflon TFM components used in the semiconductor manufacturing industry.
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