The influence of SI-GaAs crystal property on device characteristic

Xiukun He, Q. Ru, Li Ding
{"title":"The influence of SI-GaAs crystal property on device characteristic","authors":"Xiukun He, Q. Ru, Li Ding","doi":"10.1109/ICSICT.1998.785981","DOIUrl":null,"url":null,"abstract":"In this paper we have investigated the characteristics of undoped SI-GaAs crystals and carried out related experiments concerning device processes. We have analyzed the relationship between the material and device properties and studied the effect of the various parameters and their distribution in the SI-GaAs crystal on the device characteristics.","PeriodicalId":286980,"journal":{"name":"1998 5th International Conference on Solid-State and Integrated Circuit Technology. Proceedings (Cat. No.98EX105)","volume":"4 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1998-10-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"1998 5th International Conference on Solid-State and Integrated Circuit Technology. Proceedings (Cat. No.98EX105)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICSICT.1998.785981","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

In this paper we have investigated the characteristics of undoped SI-GaAs crystals and carried out related experiments concerning device processes. We have analyzed the relationship between the material and device properties and studied the effect of the various parameters and their distribution in the SI-GaAs crystal on the device characteristics.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
SI-GaAs晶体性质对器件特性的影响
本文研究了未掺杂SI-GaAs晶体的特性,并进行了相关的器件工艺实验。分析了材料与器件性能之间的关系,研究了SI-GaAs晶体中各种参数及其分布对器件性能的影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Silicon nano-crystals based MOS memory and effects of traps on charge storage characteristics Nonlinear modeling of 4 W 12 mm multi-cell microwave power GaAs MESFET Thermally excited micromechanical vacuum resonator Electrochemical etching used on UHV/CVD epitaxial thin films The reduction of base resistance of SiGe/Si HBT via ion implantation and side-wall oxide self-aligned technique
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1