{"title":"Comprehensive cycle time reduction program at AMD's fab25","authors":"F. Sadjadi, T. Baker","doi":"10.1109/ISSM.2001.962923","DOIUrl":null,"url":null,"abstract":"Manufacturing cycle time at AMD's Fab25 Austin, Texas facility has improved from the bottom third to the top of Sematech's cycle time per mask layer metric list. Steady improvement in cycle time performance has been attained in the midst of a steep ramp from 0.25 /spl mu/m to 0.18 /spl mu/m technology. This paper explains the fundamental changes that were made to accomplish these improvements and evaluate their impact upon Fab25's cycle time reduction efforts. Focus areas of interest are: philosophy and behavior, modeling, dispatching, planning, and operations.","PeriodicalId":356225,"journal":{"name":"2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. Conference Proceedings (Cat. No.01CH37203)","volume":"35 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2001-10-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. Conference Proceedings (Cat. No.01CH37203)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISSM.2001.962923","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 4
Abstract
Manufacturing cycle time at AMD's Fab25 Austin, Texas facility has improved from the bottom third to the top of Sematech's cycle time per mask layer metric list. Steady improvement in cycle time performance has been attained in the midst of a steep ramp from 0.25 /spl mu/m to 0.18 /spl mu/m technology. This paper explains the fundamental changes that were made to accomplish these improvements and evaluate their impact upon Fab25's cycle time reduction efforts. Focus areas of interest are: philosophy and behavior, modeling, dispatching, planning, and operations.