J. Sullivan, H. Kirk, Sien Kang, P. Ong, F. Henley
{"title":"Layer-transfer process modifications for fabricating hybrid crystal orientation engineered substrates","authors":"J. Sullivan, H. Kirk, Sien Kang, P. Ong, F. Henley","doi":"10.1109/SOI.2005.1563560","DOIUrl":null,"url":null,"abstract":"Successful integration of hybrid-orientation substrates into high-volume production requires a layer-transfer process to prepare the substrates. Modifications of SiGen's NanoCleave/spl trade/ layer-transfer process were tested for compatibility to cleave and smooth [110] films, produce multi-stack composites and prepare direct bonded film structures. The technology has the promise to be a viable manufacturing process for strained and unstrained hybrid-orientation substrates used for deep submicron mobility enhancement.","PeriodicalId":116606,"journal":{"name":"2005 IEEE International SOI Conference Proceedings","volume":"40 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2005-12-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2005 IEEE International SOI Conference Proceedings","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SOI.2005.1563560","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2
Abstract
Successful integration of hybrid-orientation substrates into high-volume production requires a layer-transfer process to prepare the substrates. Modifications of SiGen's NanoCleave/spl trade/ layer-transfer process were tested for compatibility to cleave and smooth [110] films, produce multi-stack composites and prepare direct bonded film structures. The technology has the promise to be a viable manufacturing process for strained and unstrained hybrid-orientation substrates used for deep submicron mobility enhancement.