D. G. Ageychenkov, A. Kaziev, D. Kolodko, A. Isakova
{"title":"Layer-by-layer deposition of transparent AZO coatings on polymer surfaces in a DС magnetron discharge","authors":"D. G. Ageychenkov, A. Kaziev, D. Kolodko, A. Isakova","doi":"10.56761/efre2022.c4-o-048401","DOIUrl":null,"url":null,"abstract":"The method of layer-by-layer deposition of transparent conductive AZO coatings on transparent polymer substrates (acrylic and polycarbonate) from two metal targets was presented. For the deposition of the ZnO layer, a metallic Zn target was sputtered in a mixture of working gases Ar and O2 (2:1). The alloying layer was prepared by a metallic Al target sputtering in Ar gas. The required ratio of the dopant in the ZnO:Al structure was achieved by varying cycle times of Al and ZnO layer deposition. The samples showed surface resistance as low as Rsmin ~ 10 Ω/□ and resistivity as low as ρmin ~ 3∙10-6 Ω∙m coupled with a high level of optical transparency.","PeriodicalId":156877,"journal":{"name":"8th International Congress on Energy Fluxes and Radiation Effects","volume":"20 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2022-11-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"8th International Congress on Energy Fluxes and Radiation Effects","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.56761/efre2022.c4-o-048401","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
The method of layer-by-layer deposition of transparent conductive AZO coatings on transparent polymer substrates (acrylic and polycarbonate) from two metal targets was presented. For the deposition of the ZnO layer, a metallic Zn target was sputtered in a mixture of working gases Ar and O2 (2:1). The alloying layer was prepared by a metallic Al target sputtering in Ar gas. The required ratio of the dopant in the ZnO:Al structure was achieved by varying cycle times of Al and ZnO layer deposition. The samples showed surface resistance as low as Rsmin ~ 10 Ω/□ and resistivity as low as ρmin ~ 3∙10-6 Ω∙m coupled with a high level of optical transparency.