K. Takano, M. Goto, E. Shiling, A. Gasasira, J. Liao
{"title":"Demonstration of MOS capacitor measurement for wafer manufacturing using a Direct Charge Measurement","authors":"K. Takano, M. Goto, E. Shiling, A. Gasasira, J. Liao","doi":"10.1109/ICMTS.2016.7476187","DOIUrl":null,"url":null,"abstract":"Direct Charge Measurement (DCM) has a capability to improve the capacitance measurement time in parametric test. Through an actual wafer measurement, we have successfully verified that DCM can measure MOS capacitor much faster than an LCR meter while keeping good correlations for wafer manufacturing.","PeriodicalId":344487,"journal":{"name":"2016 International Conference on Microelectronic Test Structures (ICMTS)","volume":"19 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-03-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 International Conference on Microelectronic Test Structures (ICMTS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICMTS.2016.7476187","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2
Abstract
Direct Charge Measurement (DCM) has a capability to improve the capacitance measurement time in parametric test. Through an actual wafer measurement, we have successfully verified that DCM can measure MOS capacitor much faster than an LCR meter while keeping good correlations for wafer manufacturing.