A high density, low leakage, 5T SRAM for embedded caches

Ingvar Carlson, S. Anderson, S. Natarajan, A. Alvandpour
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引用次数: 104

Abstract

This paper describes an embedded high density 128 Kb memory, utilizing a 5-transistor (5T) single bitline SRAM cell in a standard 0.18 /spl mu/m CMOS technology. The 5T-SRAM cell allows writing of '1', when the voltage at its single bitline is at Vcc. As a consequence, for a nondestructive read operation, the bitline is precharged to a voltage Vpc=600 mV
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高密度,低泄漏,5T SRAM用于嵌入式缓存
本文描述了一种嵌入式高密度128 Kb存储器,利用标准0.18 /spl mu/m CMOS技术中的5晶体管(5T)单位行SRAM单元。5T-SRAM单元允许在其单位线电压为Vcc时写入'1'。因此,对于非破坏性读操作,位线被预充到电压Vpc=600 mV
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