Fine Copper Lines with High Adhesion on High Rigidity Dielectrics

M. Nishida, H. Noma, Tetsuro Iwakura, Masaki Yamaguchi, Kazuyuki Mitsukura
{"title":"Fine Copper Lines with High Adhesion on High Rigidity Dielectrics","authors":"M. Nishida, H. Noma, Tetsuro Iwakura, Masaki Yamaguchi, Kazuyuki Mitsukura","doi":"10.1109/ectc51906.2022.00142","DOIUrl":null,"url":null,"abstract":"Fine line and space of 10 micrometer widths were demonstrated on a smooth surface prepreg by semi-additive process (SAP) assisted by ultraviolet (UV) irradiation. The flipchip ball grid array (FC-BGA) packages were fabricated using substrates made of prepreg with glass cloth or insulation film without glass cloth. The warpage of the package at 260 degree Celsius using prepreg was 45% of that using insulation film. The reason would be the high rigidity of prepreg. Highly Accelerated Stress Test (HAST) reliability of the comb copper pattern for the 10 micrometer line and space was also confirmed for 200 h. The SAP technology assisted by UV irradiation would be a solution not only for high-frequency application due to the smooth surface but for warpage reduction of FC-BGA package and for fine-pitch solder joint of flip-chip chip scale package (FC-CSP).","PeriodicalId":139520,"journal":{"name":"2022 IEEE 72nd Electronic Components and Technology Conference (ECTC)","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2022-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2022 IEEE 72nd Electronic Components and Technology Conference (ECTC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ectc51906.2022.00142","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

Abstract

Fine line and space of 10 micrometer widths were demonstrated on a smooth surface prepreg by semi-additive process (SAP) assisted by ultraviolet (UV) irradiation. The flipchip ball grid array (FC-BGA) packages were fabricated using substrates made of prepreg with glass cloth or insulation film without glass cloth. The warpage of the package at 260 degree Celsius using prepreg was 45% of that using insulation film. The reason would be the high rigidity of prepreg. Highly Accelerated Stress Test (HAST) reliability of the comb copper pattern for the 10 micrometer line and space was also confirmed for 200 h. The SAP technology assisted by UV irradiation would be a solution not only for high-frequency application due to the smooth surface but for warpage reduction of FC-BGA package and for fine-pitch solder joint of flip-chip chip scale package (FC-CSP).
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高硬度电介质上高附着力的细铜线
在紫外光的辅助下,采用半添加剂工艺(SAP)制备了表面光滑的预浸料,并在表面上形成了10微米宽的细线和空间。采用含玻璃布的预浸料或不含玻璃布的绝缘膜制备了倒装球栅阵列(FC-BGA)封装。使用预浸料的包装在260摄氏度下的翘曲度是使用绝缘膜的45%。原因可能是预浸料的高刚性。高加速应力测试(HAST)对10微米线和空间的梳状铜图案的可靠性也进行了200小时的验证。由于表面光滑,SAP技术不仅可以用于高频应用,还可以用于减少FC-BGA封装的翘曲和倒装芯片规模封装(FC-CSP)的细间距焊点。
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