Raman amplification and lasing in SiGe-on-insulator waveguides

V. Raghunathan, R. Claps, O. Boyraz, P. Koonath, D. Dimitropoulos, B. Jalali
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Abstract

Stimulated Raman scattering in SOI waveguides has received significant attention recently with the demonstration of pulsed, continuous wave Raman lasers and high gain Raman amplification. However, the limited bandwidth of the Raman signal in silicon (/spl sim/105GHz) renders this scheme unsuitable for broadband WDM amplification unless multi-pumping scheme is employed. Large pulsed gain and lasing have been reported in GeSi waveguides. The SiGe on SOI platform represents a Raman medium with a flexible gain spectrum.
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绝缘体上sige波导中的拉曼放大和激光
随着脉冲、连续波拉曼激光器和高增益拉曼放大的出现,SOI波导中的受激拉曼散射受到了广泛的关注。然而,硅中拉曼信号的有限带宽(/spl sim/105GHz)使得该方案不适合宽带WDM放大,除非采用多泵浦方案。在GeSi波导中已经报道了大脉冲增益和激光。SOI平台上的SiGe代表了具有灵活增益谱的拉曼介质。
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