Jianbo Liang, T. Ogawa, K. Araki, T. Kamioka, N. Shigekawa
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引用次数: 2
Abstract
The electrical properties of n-Si/ITO/n-Si, n-Si/ITO/p-Si, and p-Si/ITO/n-Si junctions fabricated by surface activated bonding (SAB) were investigated. The current-voltage (I-V) characteristics of n-Si/ITO/n-Si, n-Si/ITO/p-Si, and p-Si/ITO/n-Si junctions showed excellent linearity. The interface resistance of n-Si/ITO/p-Si junctions was found to be 0.0249 O·cm2, which is the smallest value observed in all the samples.
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