首页 > 最新文献

2017 5th International Workshop on Low Temperature Bonding for 3D Integration (LTB-3D)最新文献

英文 中文
Temperature dependence of fatigue crack propagation rate of pressureless sintered Ag nanoparticles 无压烧结银纳米颗粒疲劳裂纹扩展速率的温度依赖性
Pub Date : 2017-06-13 DOI: 10.23919/LTB-3D.2017.7947482
Ryo Kimura, Y. Kariya, N. Mizumura, K. Sasaki
The effects of temperatures on the rate of pressure-less sintered fatigue crack propagation were investigated in this study. For each test temperature, the Dowling-Begley's fatigue crack propagation law held true. Temperature effects on the behavior of fatigue crack propagation appeared mainly in the power exponent of the Dowling-Begley law.
研究了温度对无压烧结疲劳裂纹扩展速率的影响。对于每个测试温度,Dowling-Begley疲劳裂纹扩展定律都成立。温度对疲劳裂纹扩展行为的影响主要表现在Dowling-Begley定律的幂指数上。
{"title":"Temperature dependence of fatigue crack propagation rate of pressureless sintered Ag nanoparticles","authors":"Ryo Kimura, Y. Kariya, N. Mizumura, K. Sasaki","doi":"10.23919/LTB-3D.2017.7947482","DOIUrl":"https://doi.org/10.23919/LTB-3D.2017.7947482","url":null,"abstract":"The effects of temperatures on the rate of pressure-less sintered fatigue crack propagation were investigated in this study. For each test temperature, the Dowling-Begley's fatigue crack propagation law held true. Temperature effects on the behavior of fatigue crack propagation appeared mainly in the power exponent of the Dowling-Begley law.","PeriodicalId":183993,"journal":{"name":"2017 5th International Workshop on Low Temperature Bonding for 3D Integration (LTB-3D)","volume":"69 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2017-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129680806","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
A study on low temperature SAM modified POM direct bonding affected by VUV/O3 irradiation VUV/O3辐照对低温SAM改性POM直接键合的影响研究
Pub Date : 2017-06-13 DOI: 10.23919/LTB-3D.2017.7947465
Weixin Fu, Bo Ma, H. Kuwae, S. Shoji, J. Mizuno
A direct bonding of polyoxymethelene (POM) was feasible at 100 °C by using self-assembled monolayers (SAM) as surface modification method. (3-Aminopropyl)triethoxysilane (APTES) and (3-Glycidyloxypropyl)trimethoxysilane (GOPTS) were applied in our work. Surface modification carried out with different VUV/O3 irradiation conditions showed different bonding strength. In addition, the bonding condition with highest strength had an average strength of 0.37 MPa. This technology was expected to be used in packaging for micro/nano electromechanical systems (MEMS/NMES), such as bio-/medical devices.
采用自组装单层(SAM)作为表面修饰方法,在100℃下实现了聚氧甲基(POM)的直接键合。应用(3-氨基丙基)三乙氧基硅烷(APTES)和(3-缩水氧基丙基)三甲氧基硅烷(GOPTS)。不同VUV/O3辐照条件下的表面改性表现出不同的结合强度。此外,最高强度的结合条件平均强度为0.37 MPa。该技术有望用于微/纳米机电系统(MEMS/NMES)的封装,如生物/医疗设备。
{"title":"A study on low temperature SAM modified POM direct bonding affected by VUV/O3 irradiation","authors":"Weixin Fu, Bo Ma, H. Kuwae, S. Shoji, J. Mizuno","doi":"10.23919/LTB-3D.2017.7947465","DOIUrl":"https://doi.org/10.23919/LTB-3D.2017.7947465","url":null,"abstract":"A direct bonding of polyoxymethelene (POM) was feasible at 100 °C by using self-assembled monolayers (SAM) as surface modification method. (3-Aminopropyl)triethoxysilane (APTES) and (3-Glycidyloxypropyl)trimethoxysilane (GOPTS) were applied in our work. Surface modification carried out with different VUV/O3 irradiation conditions showed different bonding strength. In addition, the bonding condition with highest strength had an average strength of 0.37 MPa. This technology was expected to be used in packaging for micro/nano electromechanical systems (MEMS/NMES), such as bio-/medical devices.","PeriodicalId":183993,"journal":{"name":"2017 5th International Workshop on Low Temperature Bonding for 3D Integration (LTB-3D)","volume":"82 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2017-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126890605","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Surface activated wafer bonding of LiNbO3 and SiO2/Si for LNOI on Si 硅上LNOI对LiNbO3和SiO2/Si表面活化键合的影响
Pub Date : 2017-06-13 DOI: 10.23919/LTB-3D.2017.7947443
R. Takigawa, E. Higurashi, T. Asano
Wafer-level bonding of LiNbO3 (LN) and Si with thermally grown SiO2 layer is demonstrated using surface-activated bonding method for the realization of LiNbO3-on-Insulator (LNOI) on Si.
采用表面激活键合的方法,在硅上实现了LiNbO3-on- insulator (LNOI)的晶圆级键合。
{"title":"Surface activated wafer bonding of LiNbO3 and SiO2/Si for LNOI on Si","authors":"R. Takigawa, E. Higurashi, T. Asano","doi":"10.23919/LTB-3D.2017.7947443","DOIUrl":"https://doi.org/10.23919/LTB-3D.2017.7947443","url":null,"abstract":"Wafer-level bonding of LiNbO<inf>3</inf> (LN) and Si with thermally grown SiO<inf>2</inf> layer is demonstrated using surface-activated bonding method for the realization of LiNbO<inf>3</inf>-on-Insulator (LNOI) on Si.","PeriodicalId":183993,"journal":{"name":"2017 5th International Workshop on Low Temperature Bonding for 3D Integration (LTB-3D)","volume":"2 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2017-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125389866","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Sn-Bi added Ag-based transient liquid phase sintering for low temperature bonding Sn-Bi加入银基瞬态液相烧结进行低温键合
Pub Date : 2017-06-13 DOI: 10.23919/LTB-3D.2017.7947430
M. K. Faiz, Takehiro Yamamoto, M. Yoshida
A low temperature and low pressure fluxless bonding of plateless Cu-Cu substrates has been achieved by transient liquid phase sintering of Ag and Sn-Bi eutectic powder mixture in a formic acid reducing environment. The effects of Sn-Bi addition amount and sintering temperature to the shear strength and microstructure were investigated. Remelting temperature of the sintered paste was also examined. Shear strength of 30 weight percentage added Sn-Bi that was sintered at 250°C was over than 20 MPa. The microstructure varied with the Sn-Bi addition amount, however, mainly consisted of Ag solid solution and/or Ag-Sn intermetallic compounds (IMCs), Bi-rich phase and Cu-Sn IMCs. No remelting event at Sn-Bi eutectic temperature was observed and the remelting temperature shifted to approximately 262°C, implying the possibility for higher operation temperature although the processing was performed at lower temperature.
在甲酸还原环境下,用银和锡铋共晶粉末混合物进行瞬态液相烧结,实现了无板Cu-Cu衬底的低温低压无熔合。研究了Sn-Bi添加量和烧结温度对合金抗剪强度和显微组织的影响。研究了烧结膏体的重熔温度。250℃烧结时添加重量百分比为30的Sn-Bi抗剪强度大于20 MPa。随着Sn-Bi添加量的增加,其微观结构发生了变化,但主要由Ag固溶体和/或Ag- sn金属间化合物(IMCs)、富bi相和Cu-Sn金属间化合物组成。在Sn-Bi共晶温度下未观察到重熔事件,重熔温度约为262℃,这意味着尽管在较低温度下进行加工,但仍有可能进行更高的操作温度。
{"title":"Sn-Bi added Ag-based transient liquid phase sintering for low temperature bonding","authors":"M. K. Faiz, Takehiro Yamamoto, M. Yoshida","doi":"10.23919/LTB-3D.2017.7947430","DOIUrl":"https://doi.org/10.23919/LTB-3D.2017.7947430","url":null,"abstract":"A low temperature and low pressure fluxless bonding of plateless Cu-Cu substrates has been achieved by transient liquid phase sintering of Ag and Sn-Bi eutectic powder mixture in a formic acid reducing environment. The effects of Sn-Bi addition amount and sintering temperature to the shear strength and microstructure were investigated. Remelting temperature of the sintered paste was also examined. Shear strength of 30 weight percentage added Sn-Bi that was sintered at 250°C was over than 20 MPa. The microstructure varied with the Sn-Bi addition amount, however, mainly consisted of Ag solid solution and/or Ag-Sn intermetallic compounds (IMCs), Bi-rich phase and Cu-Sn IMCs. No remelting event at Sn-Bi eutectic temperature was observed and the remelting temperature shifted to approximately 262°C, implying the possibility for higher operation temperature although the processing was performed at lower temperature.","PeriodicalId":183993,"journal":{"name":"2017 5th International Workshop on Low Temperature Bonding for 3D Integration (LTB-3D)","volume":"11 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2017-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128727941","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Ar+H2 atmospheric-pressure plasma treatment for Au-Au bonding and influence of air exposure on surface contamination Ar+H2常压等离子体处理Au-Au键合及空气暴露对表面污染的影响
Pub Date : 2017-06-13 DOI: 10.23919/LTB-3D.2017.7947460
Michitaka Yamamoto, E. Higurashi, T. Suga, R. Sawada, T. Itoh
Au-Au room-temperature bonding in ambient air was demonstrated by applying argon and hydrogen gas mixture (Ar+H2) atmospheric-pressure (AP) plasma treatment to surface activated bonding. Although conventional Ar low-pressure plasma treatment improved bonding strength only within air exposure for 1 hour, Ar+H2 AP plasma treatment improved the bonding strength even after air exposure for 10 hours.
采用氩气和氢气混合物(Ar+H2)常压(AP)等离子体处理表面活化键合,证明了Au-Au在室温环境空气中的键合。虽然常规的氩低压等离子体处理仅在空气暴露1小时内提高了结合强度,但氩+H2 AP等离子体处理即使在空气暴露10小时后也能提高结合强度。
{"title":"Ar+H2 atmospheric-pressure plasma treatment for Au-Au bonding and influence of air exposure on surface contamination","authors":"Michitaka Yamamoto, E. Higurashi, T. Suga, R. Sawada, T. Itoh","doi":"10.23919/LTB-3D.2017.7947460","DOIUrl":"https://doi.org/10.23919/LTB-3D.2017.7947460","url":null,"abstract":"Au-Au room-temperature bonding in ambient air was demonstrated by applying argon and hydrogen gas mixture (Ar+H2) atmospheric-pressure (AP) plasma treatment to surface activated bonding. Although conventional Ar low-pressure plasma treatment improved bonding strength only within air exposure for 1 hour, Ar+H2 AP plasma treatment improved the bonding strength even after air exposure for 10 hours.","PeriodicalId":183993,"journal":{"name":"2017 5th International Workshop on Low Temperature Bonding for 3D Integration (LTB-3D)","volume":"11 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2017-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127696997","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Cu-Cu direct bonding by introducing Au intermediate layer 引入Au中间层的Cu-Cu直接键合
Pub Date : 2017-06-13 DOI: 10.23919/LTB-3D.2017.7947466
H. Noma, T. Kamibayashi, H. Kuwae, N. Suzuki, T. Nonaka, S. Shoji, J. Mizuno
Cu-Cu direct bonding under help of direct immersion gold (DIG) for multi-die fan-out wafer level package was demonstrated. Cu-Cu direct bonding is a critical technology for high-frequency applications. To solve challenges of conventional methods, the DIG was used. As a result, a cohesion failure was obtained in shear test.
研究了在直接浸金(DIG)的帮助下,Cu-Cu直接键合在多模扇形圆片级封装中的应用。Cu-Cu直接键合是高频应用的关键技术。为了解决传统方法的挑战,采用了DIG。结果表明,在剪切试验中出现了粘聚破坏。
{"title":"Cu-Cu direct bonding by introducing Au intermediate layer","authors":"H. Noma, T. Kamibayashi, H. Kuwae, N. Suzuki, T. Nonaka, S. Shoji, J. Mizuno","doi":"10.23919/LTB-3D.2017.7947466","DOIUrl":"https://doi.org/10.23919/LTB-3D.2017.7947466","url":null,"abstract":"Cu-Cu direct bonding under help of direct immersion gold (DIG) for multi-die fan-out wafer level package was demonstrated. Cu-Cu direct bonding is a critical technology for high-frequency applications. To solve challenges of conventional methods, the DIG was used. As a result, a cohesion failure was obtained in shear test.","PeriodicalId":183993,"journal":{"name":"2017 5th International Workshop on Low Temperature Bonding for 3D Integration (LTB-3D)","volume":"56 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2017-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133175473","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Fabrication processes of magneto-optic waveguides with Si guiding layer for optical nonreciprocal devices 光学非互易器件用硅导层磁光波导的制备工艺
Pub Date : 2017-06-13 DOI: 10.23919/LTB-3D.2017.7947478
Salinee Choowitsakunlert, K. Takagiwa, Takuya Kobashigawa, Nariaki Hosoya, R. Silapunt, H. Yokoi
An optical isolator employing a nonreciprocal guided-radiation mode conversion has been investigated. This device consists of a rib-type magneto-optic waveguide with a Si guiding layer. Relationship of waveguide parameters for isolator operation was clarified for various gaps. Fabrication processes of the magneto-optic waveguides are discussed by comparing waveguide parameters for isolator operation.
研究了一种采用非互易导辐射模式转换的光隔离器。该器件由带硅导层的肋型磁光波导组成。阐明了不同间隙下波导参数对隔离器工作的影响关系。通过比较隔离器工作时的波导参数,讨论了磁光波导的制作工艺。
{"title":"Fabrication processes of magneto-optic waveguides with Si guiding layer for optical nonreciprocal devices","authors":"Salinee Choowitsakunlert, K. Takagiwa, Takuya Kobashigawa, Nariaki Hosoya, R. Silapunt, H. Yokoi","doi":"10.23919/LTB-3D.2017.7947478","DOIUrl":"https://doi.org/10.23919/LTB-3D.2017.7947478","url":null,"abstract":"An optical isolator employing a nonreciprocal guided-radiation mode conversion has been investigated. This device consists of a rib-type magneto-optic waveguide with a Si guiding layer. Relationship of waveguide parameters for isolator operation was clarified for various gaps. Fabrication processes of the magneto-optic waveguides are discussed by comparing waveguide parameters for isolator operation.","PeriodicalId":183993,"journal":{"name":"2017 5th International Workshop on Low Temperature Bonding for 3D Integration (LTB-3D)","volume":"3 3","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2017-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132365312","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Fabrication and evaluation of molding and bonding tools for Au micromirror formation 金微镜成型成型和粘接工具的制造与评价
Pub Date : 2017-06-13 DOI: 10.23919/LTB-3D.2017.7947480
R. Nishimura, Seiya Matsuoka, E. Higurashi, T. Suga, R. Sawada
In order to fabricate Au micromirrors using a method of simultaneous molding and low-temperature Au-Au bonding, a fabrication method of molding and bonding tools using diamond blade dicing is investigated. Diamond blade dicing of synthetic quartz glass substrates produced smooth sidewall surfaces with root-mean-square roughness of 8 nm in the sample translation direction and that of 56 nm in the perpendicular to the translation direction. Using these fabricated tools, Au micromirrors were successfully formed at 150 °C.
为了采用同时成型和低温金-金键合的方法制备金微镜,研究了一种金刚石刀片切割成型和键合工具的制备方法。人造石英玻璃基板的金刚石刀片切割产生光滑的侧壁表面,样品平移方向的均方根粗糙度为8 nm,垂直于平移方向的均方根粗糙度为56 nm。利用这些工具,在150°C下成功地形成了金微镜。
{"title":"Fabrication and evaluation of molding and bonding tools for Au micromirror formation","authors":"R. Nishimura, Seiya Matsuoka, E. Higurashi, T. Suga, R. Sawada","doi":"10.23919/LTB-3D.2017.7947480","DOIUrl":"https://doi.org/10.23919/LTB-3D.2017.7947480","url":null,"abstract":"In order to fabricate Au micromirrors using a method of simultaneous molding and low-temperature Au-Au bonding, a fabrication method of molding and bonding tools using diamond blade dicing is investigated. Diamond blade dicing of synthetic quartz glass substrates produced smooth sidewall surfaces with root-mean-square roughness of 8 nm in the sample translation direction and that of 56 nm in the perpendicular to the translation direction. Using these fabricated tools, Au micromirrors were successfully formed at 150 °C.","PeriodicalId":183993,"journal":{"name":"2017 5th International Workshop on Low Temperature Bonding for 3D Integration (LTB-3D)","volume":"2 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2017-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"134110512","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Plane-view transmission electron microscopy of Si/GaAs interfaces fabricated by surface-activated bonding at room temperature 室温下表面活化键合制备的Si/GaAs界面的平面透射电镜研究
Pub Date : 2017-05-16 DOI: 10.23919/LTB-3D.2017.7947400
Y. Ohno, H. Yoshida, S. Takeda, L. Jianbo, N. Shigekawa
Si/GaAs interfaces fabricated by surface-activated bonding at room temperature were examined by plane-view transmission electron microscopy. It was hypothesized that the interface resistance would be originated from surface defects on the Si and GaAs substrates introduced during the bonding process.
采用平面透射电镜对室温下表面活化键合制备的Si/GaAs界面进行了研究。假设界面电阻是由Si和GaAs衬底在键合过程中引入的表面缺陷引起的。
{"title":"Plane-view transmission electron microscopy of Si/GaAs interfaces fabricated by surface-activated bonding at room temperature","authors":"Y. Ohno, H. Yoshida, S. Takeda, L. Jianbo, N. Shigekawa","doi":"10.23919/LTB-3D.2017.7947400","DOIUrl":"https://doi.org/10.23919/LTB-3D.2017.7947400","url":null,"abstract":"Si/GaAs interfaces fabricated by surface-activated bonding at room temperature were examined by plane-view transmission electron microscopy. It was hypothesized that the interface resistance would be originated from surface defects on the Si and GaAs substrates introduced during the bonding process.","PeriodicalId":183993,"journal":{"name":"2017 5th International Workshop on Low Temperature Bonding for 3D Integration (LTB-3D)","volume":"31 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2017-05-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"134222857","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Room temperature bonding and debonding of PI film and glass substrate based on SAB method 基于SAB法的PI膜与玻璃基板的室温粘接与脱粘
Pub Date : 2017-05-16 DOI: 10.23919/LTB-3D.2017.7947434
K. Takeuchi, M. Fujino, Y. Matsumoto, T. Suga
In the previews study, we have proposed the room temperature bonding method for polyimide (PI) films and glass wafers that enables debonding even after high temperature process at 400 °C. However, the mechanism that the bond strength was affected by heating was not clear. In this work, we investigated the relationship between the heat treatment and the bond strength of PI films and glass wafers. From the XPS analysis, it was cleared that the fracture path of the PI film shifted to the interface between the PI and the Si intermediate layer from the inner PI film. We indicated the debonding process of the PI and the glass substrates bonded with Si and Fe layers.
在预览研究中,我们提出了聚酰亚胺(PI)薄膜和玻璃晶圆的室温键合方法,即使在400°C的高温过程中也能实现脱粘。然而,加热对粘结强度影响的机理尚不清楚。本文研究了热处理与PI薄膜与玻璃晶圆的结合强度之间的关系。从XPS分析可以看出,PI膜的断裂路径从PI膜内部向PI与Si中间层之间的界面转移。我们指出了PI和玻璃衬底与Si和Fe层结合的脱键过程。
{"title":"Room temperature bonding and debonding of PI film and glass substrate based on SAB method","authors":"K. Takeuchi, M. Fujino, Y. Matsumoto, T. Suga","doi":"10.23919/LTB-3D.2017.7947434","DOIUrl":"https://doi.org/10.23919/LTB-3D.2017.7947434","url":null,"abstract":"In the previews study, we have proposed the room temperature bonding method for polyimide (PI) films and glass wafers that enables debonding even after high temperature process at 400 °C. However, the mechanism that the bond strength was affected by heating was not clear. In this work, we investigated the relationship between the heat treatment and the bond strength of PI films and glass wafers. From the XPS analysis, it was cleared that the fracture path of the PI film shifted to the interface between the PI and the Si intermediate layer from the inner PI film. We indicated the debonding process of the PI and the glass substrates bonded with Si and Fe layers.","PeriodicalId":183993,"journal":{"name":"2017 5th International Workshop on Low Temperature Bonding for 3D Integration (LTB-3D)","volume":"30 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2017-05-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114349439","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
期刊
2017 5th International Workshop on Low Temperature Bonding for 3D Integration (LTB-3D)
全部 Acc. Chem. Res. ACS Applied Bio Materials ACS Appl. Electron. Mater. ACS Appl. Energy Mater. ACS Appl. Mater. Interfaces ACS Appl. Nano Mater. ACS Appl. Polym. Mater. ACS BIOMATER-SCI ENG ACS Catal. ACS Cent. Sci. ACS Chem. Biol. ACS Chemical Health & Safety ACS Chem. Neurosci. ACS Comb. Sci. ACS Earth Space Chem. ACS Energy Lett. ACS Infect. Dis. ACS Macro Lett. ACS Mater. Lett. ACS Med. Chem. Lett. ACS Nano ACS Omega ACS Photonics ACS Sens. ACS Sustainable Chem. Eng. ACS Synth. Biol. Anal. Chem. BIOCHEMISTRY-US Bioconjugate Chem. BIOMACROMOLECULES Chem. Res. Toxicol. Chem. Rev. Chem. Mater. CRYST GROWTH DES ENERG FUEL Environ. Sci. Technol. Environ. Sci. Technol. Lett. Eur. J. Inorg. Chem. IND ENG CHEM RES Inorg. Chem. J. Agric. Food. Chem. J. Chem. Eng. Data J. Chem. Educ. J. Chem. Inf. Model. J. Chem. Theory Comput. J. Med. Chem. J. Nat. Prod. J PROTEOME RES J. Am. Chem. Soc. LANGMUIR MACROMOLECULES Mol. Pharmaceutics Nano Lett. Org. Lett. ORG PROCESS RES DEV ORGANOMETALLICS J. Org. Chem. J. Phys. Chem. J. Phys. Chem. A J. Phys. Chem. B J. Phys. Chem. C J. Phys. Chem. Lett. Analyst Anal. Methods Biomater. Sci. Catal. Sci. Technol. Chem. Commun. Chem. Soc. Rev. CHEM EDUC RES PRACT CRYSTENGCOMM Dalton Trans. Energy Environ. Sci. ENVIRON SCI-NANO ENVIRON SCI-PROC IMP ENVIRON SCI-WAT RES Faraday Discuss. Food Funct. Green Chem. Inorg. Chem. Front. Integr. Biol. J. Anal. At. Spectrom. J. Mater. Chem. A J. Mater. Chem. B J. Mater. Chem. C Lab Chip Mater. Chem. Front. Mater. Horiz. MEDCHEMCOMM Metallomics Mol. Biosyst. Mol. Syst. Des. Eng. Nanoscale Nanoscale Horiz. Nat. Prod. Rep. New J. Chem. Org. Biomol. Chem. Org. Chem. Front. PHOTOCH PHOTOBIO SCI PCCP Polym. Chem.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1