Emitter-Base Profile Optimization of SiGe HBTs for Improved Thermal Stability and Frequency Response at Low-Bias Currents

U. Raghunathan, Brian R. Wier, Zachary E. Fleetwood, Michael A. Oakley, V. Jain, J. Cressler
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引用次数: 1

Abstract

We explore different vertical profile designs with optimized emitter-base (EB) junctions targeting both constant current gain $(\beta)$ across temperature and broadened $\mathbf{f}_{\mathbf{T}}/\mathbf{f}_{\max}$ curves for improved large-signal linearity. This work explicitly examines achieving a temperature-independent $\beta$ via profile design in SiGe HBTs, and explores the limitations using triangular and ledge-based Ge profiles at the EB junction. The effects of base width and the EB junction separation length are also investigated for reduced parasitic capacitance and improved frequency response at low-bias currents. This work presents the underlying theory, along with the measured results for the two optimization targets, both of which should aid in designing circuits with better linearity and stability across bias and temperature corners.
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在低偏置电流下改善热稳定性和频率响应的SiGe HBTs发射基剖面优化
我们探索了不同的垂直轮廓设计,优化了发射极-基极(EB)结,针对温度范围内的恒定电流增益$(\beta)$和宽$\mathbf{f}_{\mathbf{T}}/\mathbf{f}_{\max}$曲线,以改善大信号线性。这项工作明确地研究了通过SiGe HBTs的轮廓设计实现与温度无关的$\beta$,并探讨了在EB结使用三角形和基于壁架的Ge轮廓的局限性。研究了基极宽度和EB结分离长度对降低寄生电容和改善低偏置电流下频率响应的影响。这项工作提出了基本的理论,以及两个优化目标的测量结果,这两者都应该有助于设计具有更好的线性度和跨偏置角和温度角稳定性的电路。
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