Electrical performance of vertical natural capacitor for RF system-on-chip in 32-nm technology

E. Liu, E. Li
{"title":"Electrical performance of vertical natural capacitor for RF system-on-chip in 32-nm technology","authors":"E. Liu, E. Li","doi":"10.1109/EPEPS.2011.6100179","DOIUrl":null,"url":null,"abstract":"Radio frequency system-on-chips (RF SoC) require high quality passive devices such as capacitors. We comprehensively studied the vertical natural capacitors (VNCAP) made of CMOS back-end-of-lines (BEOL) in 32-nm technology. We used electromagnetic simulation and a Pi-type equivalent circuit model for the study of the VNCAP, and reported its electrical characteristics including the scattering parameter, effective capacitance, self-resonant frequency and quality factor up to 20 GHz. We also briefly discussed the performance scaling trend of VNCAPs from 65-nm to 32-nm technology.","PeriodicalId":313560,"journal":{"name":"2011 IEEE 20th Conference on Electrical Performance of Electronic Packaging and Systems","volume":"8 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2011-12-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2011 IEEE 20th Conference on Electrical Performance of Electronic Packaging and Systems","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/EPEPS.2011.6100179","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 4

Abstract

Radio frequency system-on-chips (RF SoC) require high quality passive devices such as capacitors. We comprehensively studied the vertical natural capacitors (VNCAP) made of CMOS back-end-of-lines (BEOL) in 32-nm technology. We used electromagnetic simulation and a Pi-type equivalent circuit model for the study of the VNCAP, and reported its electrical characteristics including the scattering parameter, effective capacitance, self-resonant frequency and quality factor up to 20 GHz. We also briefly discussed the performance scaling trend of VNCAPs from 65-nm to 32-nm technology.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
32纳米射频片上系统垂直自然电容的电学性能
射频片上系统(RF SoC)需要高质量的无源器件,如电容器。我们全面研究了32纳米工艺的CMOS后端线(BEOL)垂直自然电容器(VNCAP)。采用电磁仿真和pi型等效电路模型对VNCAP进行了研究,并报道了VNCAP的电学特性,包括散射参数、有效电容、自谐振频率和品质因子,最高可达20 GHz。我们还简要讨论了vncap从65纳米到32纳米的性能缩放趋势。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Simulations of pulse signals with X-parameters Extraction of jitter parameters from BER measurements Full-wave PEEC time domain solver based on leapfrog scheme Bended differential transmission line using short-circuited coupled line for common-mode noise suppression Deriving voltage tolerance specification for processor circuit design
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1