Three-independent gate FET's super steep subthreshold slope

Jorge Romero-González, P. Gaillardon
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Abstract

The device characteristics of TIGFET technology, in particular the steep subthreshold slope (SS), have been studied in detail in this chapter. Notably, we have (1) summarized TIGFET's working principle and fabrication techniques, (2) reviewed experimental demonstrations of SSmin in TIGFETs with respect to voltage and temperature, and (3) performed device-level simulations to display and thoroughly explain the SS capabilities of TIGFETs with respect to channel length and voltage. Our results allow us to develop an in-depth explanation into the origin of steep SS and the potential limitations of SS in TIGFETs due to short-channel effects.
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三独立栅极场效应晶体管的超陡阈下斜率
本章详细研究了TIGFET技术的器件特性,特别是陡阈下斜率(SS)。值得注意的是,我们(1)总结了TIGFET的工作原理和制造技术,(2)回顾了TIGFET中SSmin在电压和温度方面的实验演示,以及(3)进行了器件级模拟,以显示和彻底解释TIGFET在通道长度和电压方面的SS能力。我们的结果使我们能够深入解释陡SS的起源以及由于短通道效应导致的tigfet中SS的潜在限制。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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