Experiments on electron-beam irradiation effects on junction field effect transistors

C. Codreann, E. Iliescu
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Abstract

The paper describes some results concerning electron-beam irradiation effects on dual monolithic n-channel junction field effect transistors. Devices were gradually irradiated up to 8 Mrad in steps of 1 Mrad or 2 Mrad at room temperature. After each irradiation operation, their electrical parameters were measured and finally we have analyzed the structural modifications in devices and their irradiation hardness.
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电子束辐照结场效应晶体管的实验研究
本文介绍了电子束辐照对双单片n沟道结场效应晶体管的影响。在室温下,以1 Mrad或2 Mrad的步骤逐渐照射器件至8 Mrad。在每次辐照操作后,测量了器件的电学参数,并分析了器件的结构变化和辐照硬度。
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