Brightness Improvement and limited Forward Voltage of the AlGaInP MQW LED with Wet-Oxidation by Taguchi Method

R. Lin, Jen‐Chih Li, T. Nee
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引用次数: 3

Abstract

To increase the external quantum efficiency of LED while limiting its forward voltage (Vf), we prepared both (AlxGa1–x)0.5In0.5P LED and buried oxides through selective wet oxidation of the AlAs layers of AlAs/GaAs distributed Bragg reflectors (DBRs). The wet oxidation process forms a stable AlxO material that acts as an insulation layer that affects both the carrier and optical confinements. The stable AlxO material that formed confined the transport region of injection carriers effectively and strongly decreased the chance of the carrier being trapped within the surface layer. To determine the trade-off conditions for LED oxidation, we used the Taguchi method which is a robust technique that is often used to analyze the significant trends that occur under a set of oxidation condition. In this study we uses an L9orthogonal array to measure the effects that a series of factors have upon the maximum brightness performance of the LED in an effort to limit the values of Vf. Relative to the as-grown LED, the oxidized LED that was treated under the trade-off wet-oxidation conditions displayed a sharply enhance the brightness (62.4% increase) in conjunction with only a slightly increased value of Vf(only a 24.5% increase).
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田口湿氧化法提高AlGaInP MQW LED亮度和限制正向电压
为了提高LED的外量子效率,同时限制其正向电压(Vf),我们通过选择性湿氧化AlAs/GaAs分布式Bragg反射器(DBRs)的AlAs层来制备(AlxGa1-x)0.5In0.5P LED和埋藏氧化物。湿氧化过程形成稳定的AlxO材料,作为绝缘层,影响载流子和光限制。形成的稳定的AlxO材料有效地限制了注入载流子的输运区域,有力地降低了载流子被困在表层的机会。为了确定LED氧化的权衡条件,我们使用了田口方法,这是一种强大的技术,通常用于分析在一组氧化条件下发生的重要趋势。在本研究中,我们使用l9正交阵列来测量一系列因素对LED最大亮度性能的影响,以限制Vf的值。相对于生长的LED,在湿氧化交换条件下处理的氧化LED显示出亮度急剧增强(增加62.4%),而Vf值仅略有增加(仅增加24.5%)。
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