{"title":"SiGeC materials","authors":"H. Osten","doi":"10.1109/sim.1996.570938","DOIUrl":null,"url":null,"abstract":"The growth and properties of Sil,Cy and Sil~,GeXC, alloys pseudomorphically strained on Si(OO1) will be reviewed. Although the bulk solubility of carbon in silicon is small, epitaxial layers with more than 1 at.% C can be fabricated. The relation between substitutional and interstitial carbon incorporation will be presented. Substitutionally incorporated C atoms allow strain manipulation, including the growth of strain-free or inversely strained Sil~,GeXCy layers. The mechanical properties, microscopic structure, thermal stability, as well as the influence of C atoms on band structure will be discussed.","PeriodicalId":391894,"journal":{"name":"Proceedings of Semiconducting and Semi-Insulating Materials Conference","volume":"57 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of Semiconducting and Semi-Insulating Materials Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/sim.1996.570938","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

Abstract

The growth and properties of Sil,Cy and Sil~,GeXC, alloys pseudomorphically strained on Si(OO1) will be reviewed. Although the bulk solubility of carbon in silicon is small, epitaxial layers with more than 1 at.% C can be fabricated. The relation between substitutional and interstitial carbon incorporation will be presented. Substitutionally incorporated C atoms allow strain manipulation, including the growth of strain-free or inversely strained Sil~,GeXCy layers. The mechanical properties, microscopic structure, thermal stability, as well as the influence of C atoms on band structure will be discussed.
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SiGeC材料
本文综述了在Si(OO1)表面进行假晶应变的Sil,Cy和Sil~,GeXC合金的生长和性能。虽然碳在硅中的体积溶解度很小,但外延层大于1 at。% C可以制造。本文将介绍取代碳与间隙碳结合的关系。取代加入的C原子允许应变操作,包括无应变或反应变的Sil~, gexy层的生长。讨论了其力学性能、微观结构、热稳定性以及C原子对能带结构的影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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