R. Jani, John Sukjin Kim, Minhwa Kim Jacoby, S. Rajendran, Shrikant Kashibhatla
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引用次数: 1
Abstract
Optimizing NF3 cleaning is crucial in minimizing defects seen in the process. In this paper, we took a different approach to maximize particle reduction using both conventional and non- conventional endpointing methods. Cleaning indicators, typically monitored during cleaning recipe, were also monitored during deposition. Implementation of additional purging significantly reduced remnants of cleaning byproducts during deposition. Our additional testing with reduction and dilution of NF3 flow showed improvements in cleaning efficiency. In this paper, we show that optimization of NF3 cleaning recipe using methods in addition to cleaning time optimization can reduce defects seen in the process.