Erik Collart, M. Mooney, Luke Evason, Vincent Giorgi, David Hunt, Antonio Serapiglia, A. Ifould
{"title":"Providing Key Process Enabling Vacuum Capability Through Integrated Sub-Fab Data Management","authors":"Erik Collart, M. Mooney, Luke Evason, Vincent Giorgi, David Hunt, Antonio Serapiglia, A. Ifould","doi":"10.1109/ASMC.2019.8791813","DOIUrl":null,"url":null,"abstract":"The sub-fab, with its vacuum, abatement and ancillary systems has evolved dramatically over the years. In many ways it has become as sophisticated as the fab itself, and now provides key enabling process technology. There is also a growing recognition among semiconductor manufacturers that sub-fab information can no longer be dismissed when it comes to fab process and yield optimization. Available sub-fab data sources such as equipment parameters, process data and equipment fault analyses will be discussed, as well as how these may be integrated to provide overall sub fab health monitoring and deliver vacuum conditions required by today’s leading-edge technology nodes.","PeriodicalId":287541,"journal":{"name":"2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)","volume":"27 2 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2019-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ASMC.2019.8791813","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2
Abstract
The sub-fab, with its vacuum, abatement and ancillary systems has evolved dramatically over the years. In many ways it has become as sophisticated as the fab itself, and now provides key enabling process technology. There is also a growing recognition among semiconductor manufacturers that sub-fab information can no longer be dismissed when it comes to fab process and yield optimization. Available sub-fab data sources such as equipment parameters, process data and equipment fault analyses will be discussed, as well as how these may be integrated to provide overall sub fab health monitoring and deliver vacuum conditions required by today’s leading-edge technology nodes.