Insulated-Gate Integrated III-Nitride RF Switches

R. Gaska, J. Yang, D. Billingsley, B. Khan, G. Simin, H. Y. Wong, N. Braga, X. Hu, J. Deng, M. Shur, R. Mickevicius
{"title":"Insulated-Gate Integrated III-Nitride RF Switches","authors":"R. Gaska, J. Yang, D. Billingsley, B. Khan, G. Simin, H. Y. Wong, N. Braga, X. Hu, J. Deng, M. Shur, R. Mickevicius","doi":"10.1109/CSICS.2011.6062470","DOIUrl":null,"url":null,"abstract":"Monolithically integrated microwave switches based on insulated gate transistors benefit from extremely small leakage currents crucially important for large-periphery devices. Composite fast/slow gate design and nonlinearity compensation technique allow the insulated gate switches to achieving superior performance compared to existing RF switch types.","PeriodicalId":275064,"journal":{"name":"2011 IEEE Compound Semiconductor Integrated Circuit Symposium (CSICS)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2011-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2011 IEEE Compound Semiconductor Integrated Circuit Symposium (CSICS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CSICS.2011.6062470","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

Abstract

Monolithically integrated microwave switches based on insulated gate transistors benefit from extremely small leakage currents crucially important for large-periphery devices. Composite fast/slow gate design and nonlinearity compensation technique allow the insulated gate switches to achieving superior performance compared to existing RF switch types.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
绝缘栅集成iii -氮化物射频开关
基于绝缘栅晶体管的单片集成微波开关具有极小的漏电流,这对大型外围器件至关重要。与现有的射频开关类型相比,复合快/慢门设计和非线性补偿技术使绝缘门开关具有优越的性能。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
A Q-Band Amplifier Implemented with Stacked 45-nm CMOS FETs Degradation of AlGaN/GaN High Electron Mobility Transistors from X-Band Operation Applications of SOI Technologies to Communication A 42 GHz Amplifier Designed Using Common-Gate Load Pull A 75 mW 210 GHz Power Amplifier Module
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1