Impact ionization at low drain voltages in SOI FETs

J. B. Mckitterick
{"title":"Impact ionization at low drain voltages in SOI FETs","authors":"J. B. Mckitterick","doi":"10.1109/SOSSOI.1990.145734","DOIUrl":null,"url":null,"abstract":"It is universally assumed that impact ionization has no noticeable effects in FETs at low drain voltages, e.g. 0.1 volts. It is pointed out that in SOI FETs without a body contact the effects of impact ionization, though somewhat subtle, are significant. Proper inclusion of impact ionization effects in modeling does not appear to affect the gross characteristics of the device, yet it has a profound impact on the correct interpretation of such derived quantities as lifetime.<<ETX>>","PeriodicalId":344373,"journal":{"name":"1990 IEEE SOS/SOI Technology Conference. Proceedings","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1990-10-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"1990 IEEE SOS/SOI Technology Conference. Proceedings","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SOSSOI.1990.145734","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

Abstract

It is universally assumed that impact ionization has no noticeable effects in FETs at low drain voltages, e.g. 0.1 volts. It is pointed out that in SOI FETs without a body contact the effects of impact ionization, though somewhat subtle, are significant. Proper inclusion of impact ionization effects in modeling does not appear to affect the gross characteristics of the device, yet it has a profound impact on the correct interpretation of such derived quantities as lifetime.<>
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SOI fet低漏极电压下的冲击电离
人们普遍认为,在低漏极电压(例如0.1伏)下,冲击电离对场效应管没有明显的影响。本文指出,在无体接触的SOI场效应管中,冲击电离的影响虽然有些微小,但却是显著的。在建模中适当地包括碰撞电离效应似乎不会影响装置的总体特性,但它对诸如寿命等衍生量的正确解释有深远的影响。
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