Analysis of InP/InGaAs double heterostructure bipolar transistors for high frequency applications

M. Meyyappan, G. Andrews, B. J. Morrison, J. P. Kreskovsky, J.P. Grubin, H. Grubin
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引用次数: 1

Abstract

The results of a two-dimensional simulation of an InP/InGaAs double heterostructure bipolar transistor are discussed. High-frequency performance is evaluated from transient solutions to the governing equations. The computed f/sub max/ is found to be larger than twice f/sub I/ over a wide range of collector current; values of f/sub max/ as high as 190 GHz have been computed for unoptimized structures. Proper doping and compositional grading in the base and collector layers are shown to reduce the problem of the conduction band spike at high collector current densities.<>
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用于高频应用的InP/InGaAs双异质结构双极晶体管分析
讨论了InP/InGaAs双异质结构双极晶体管的二维模拟结果。从暂态解到控制方程对高频性能进行了评估。在很宽的集电极电流范围内,计算得到的f/sub max/大于f/sub I/的两倍;对非优化结构的f/sub max/高达190 GHz的值进行了计算。在基极层和集电极层中适当的掺杂和成分分级可以减少高集电极电流密度下的导带尖峰问题
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