{"title":"IC layout and manufacturability: critical links and design flow implications","authors":"A. Kahng","doi":"10.1109/ICVD.1999.745132","DOIUrl":null,"url":null,"abstract":"We assess the prospects for new tools and flows in the interface between layout design and manufacturability. We begin with a review of classic elements of this interface, then focus on more recently critical issues: (i) layout design for reduced CMP variability; (ii) layout design for PSM; and (iii) layout design for OPC. Our discussion highlights the many ways in which layout affords effective means of optimizing manufacturability, as well as opportunities for research and development.","PeriodicalId":443373,"journal":{"name":"Proceedings Twelfth International Conference on VLSI Design. (Cat. No.PR00013)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1999-01-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings Twelfth International Conference on VLSI Design. (Cat. No.PR00013)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICVD.1999.745132","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 5
Abstract
We assess the prospects for new tools and flows in the interface between layout design and manufacturability. We begin with a review of classic elements of this interface, then focus on more recently critical issues: (i) layout design for reduced CMP variability; (ii) layout design for PSM; and (iii) layout design for OPC. Our discussion highlights the many ways in which layout affords effective means of optimizing manufacturability, as well as opportunities for research and development.
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