A 1.0GHz multi-banked embedded DRAM in 65nm CMOS featuring concurrent refresh and hierarchical BIST

D. Anand, J. Covino, J. Dreibelbis, J. Fifield, Kevin W. Gorman, M. Jacunski, Jake Paparelli, G. Pomichter, D. Pontius, M. Roberge, Stephen Sliva
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引用次数: 4

Abstract

An embedded DRAM macro fabricated in 65 nm CMOS achieves 1.0 GHz multi-banked operation at 1.0 V yielding 584 Gbits/sec. The array utilizes a 0.1 1 mum2 cell with 20 fF deep trench capacitor and 2.2 nm gate oxide transfer gate. Concurrent refresh allows for high availability via a second bank address. At-speed test and repair is accomplished with a new hierarchical BIST architecture. Measured random cycle time exceeds 333 MHz at 1.0 V with functional operation from 750 mV to 1.5 V and densities up to 36.5 Mbits.
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基于65nm CMOS的1.0GHz多组嵌入式DRAM,具有并行刷新和分层BIST特性
在65纳米CMOS中制造的嵌入式DRAM宏在1.0 V下实现了1.0 GHz多银行操作,产生584 gbit /s。该阵列采用0.1 mm2电池,20 fF深沟电容器和2.2 nm栅氧化转移栅。并发刷新允许通过第二个银行地址实现高可用性。高速测试和修复是通过一种新的分层式BIST架构完成的。测量的随机周期时间在1.0 V下超过333 MHz,功能工作范围为750 mV至1.5 V,密度高达36.5 Mbits。
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