{"title":"A comprehensive CAM environment for fast-turn IC prototyping","authors":"C.B. Barnum, D. Cunningham","doi":"10.1109/ASMC.1990.111230","DOIUrl":null,"url":null,"abstract":"A prototype integrated-circuit (IC) computer-aided-manufacturing (CAM) environment to support university education and research programs is described. The CAM system, mask making, and wafer fabrication are discussed. Process controls and the assembly process are described.<<ETX>>","PeriodicalId":158760,"journal":{"name":"IEEE/SEMI Conference on Advanced Semiconductor Manufacturing Workshop","volume":"87 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1990-09-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE/SEMI Conference on Advanced Semiconductor Manufacturing Workshop","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ASMC.1990.111230","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
A prototype integrated-circuit (IC) computer-aided-manufacturing (CAM) environment to support university education and research programs is described. The CAM system, mask making, and wafer fabrication are discussed. Process controls and the assembly process are described.<>
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