A Surface Potential- and Physics- Based Compact Model for 2D Polycrystalline-MoS2FET with Resistive Switching Behavior in Neuromorphic Computing

Lingfei Wang, Lin Wang, K. Ang, A. Thean, G. Liang
{"title":"A Surface Potential- and Physics- Based Compact Model for 2D Polycrystalline-MoS2FET with Resistive Switching Behavior in Neuromorphic Computing","authors":"Lingfei Wang, Lin Wang, K. Ang, A. Thean, G. Liang","doi":"10.1109/IEDM.2018.8614655","DOIUrl":null,"url":null,"abstract":"For the first time, a surface potential- and physics-based compact model for two dimensional (2D) polycrystalline-molybdenum disulfide (MoS2) field effect transistors (FETs) with resistive switching (RS) behavior is developed and verified by experimental data. This model is incorporated with the theories of thermal activation transport, grain boundary (GB) barrier and space charge limited current (SCLC). Based on the GB induced disorders, the grain size, low temperature and high electrical field dependent characteristics are studied. The predicted transfer and output characteristics have excellent quantitative agreement with experimental results. Furthermore, considering the hopping process induced defect- (i.e., sulfur vacancy) redistribution, the GB (e.g., intersecting or bisecting GB) dependent resistive switching behavior is physically investigated. Finally, this model is implemented to simulate the synaptic activity such as short-term/long-term plasticity, which indicates the possibility of using 2D-FETs for neuromorphic computing applications.","PeriodicalId":152963,"journal":{"name":"2018 IEEE International Electron Devices Meeting (IEDM)","volume":"23 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2018-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2018 IEEE International Electron Devices Meeting (IEDM)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IEDM.2018.8614655","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

Abstract

For the first time, a surface potential- and physics-based compact model for two dimensional (2D) polycrystalline-molybdenum disulfide (MoS2) field effect transistors (FETs) with resistive switching (RS) behavior is developed and verified by experimental data. This model is incorporated with the theories of thermal activation transport, grain boundary (GB) barrier and space charge limited current (SCLC). Based on the GB induced disorders, the grain size, low temperature and high electrical field dependent characteristics are studied. The predicted transfer and output characteristics have excellent quantitative agreement with experimental results. Furthermore, considering the hopping process induced defect- (i.e., sulfur vacancy) redistribution, the GB (e.g., intersecting or bisecting GB) dependent resistive switching behavior is physically investigated. Finally, this model is implemented to simulate the synaptic activity such as short-term/long-term plasticity, which indicates the possibility of using 2D-FETs for neuromorphic computing applications.
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神经形态计算中具有电阻开关行为的二维多晶mos2fet的表面电位和物理紧凑模型
本文首次建立了具有电阻开关特性的二维(2D)多晶二硫化钼(MoS2)场效应晶体管(fet)基于表面电位和物理的紧凑模型,并通过实验数据进行了验证。该模型结合了热激活输运理论、晶界势垒理论和空间电荷限制电流理论。基于GB诱导的畸变,研究了晶粒尺寸、低温和高电场的依赖特性。预测的转移和输出特性与实验结果有很好的定量一致性。此外,考虑到跳跃过程引起的缺陷-(即硫空位)重分布,物理研究了GB(例如,交叉点或等分点GB)依赖的电阻开关行为。最后,该模型用于模拟突触活动,如短期/长期可塑性,这表明将2d场效应管用于神经形态计算应用的可能性。
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