B. Atwood, T. Ishii, Takao Watanabe, T. Mine, N. Kameshiro, T. Sano, K. Yano
{"title":"A cavity channel SESO embedded memory with low standby-power techniques","authors":"B. Atwood, T. Ishii, Takao Watanabe, T. Mine, N. Kameshiro, T. Sano, K. Yano","doi":"10.1109/ESSCIR.2004.1356690","DOIUrl":null,"url":null,"abstract":"A 22F/sup 2/ 3-transistor dynamic memory cell, based on a newly fabricated cavity channel SESO (single-electron shutoff) transistor is proposed for low-power mobile SOCs. The ultra-low leakage SESO device is formed above the bulk devices to yield the small cell size. With low-power techniques, this memory can achieve nearly an order of magnitude lower standby power than conventional memory. A 1 Mbyte SESO embedded memory core is estimated to have a standby power consumption of 24.2 /spl mu/A in a 90 nm process.","PeriodicalId":294077,"journal":{"name":"Proceedings of the 30th European Solid-State Circuits Conference","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2004-11-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of the 30th European Solid-State Circuits Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ESSCIR.2004.1356690","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
A 22F/sup 2/ 3-transistor dynamic memory cell, based on a newly fabricated cavity channel SESO (single-electron shutoff) transistor is proposed for low-power mobile SOCs. The ultra-low leakage SESO device is formed above the bulk devices to yield the small cell size. With low-power techniques, this memory can achieve nearly an order of magnitude lower standby power than conventional memory. A 1 Mbyte SESO embedded memory core is estimated to have a standby power consumption of 24.2 /spl mu/A in a 90 nm process.