{"title":"Correction of iso-focal tilt in phase edge lithography by adjustment of primary spherical aberration","authors":"S. Nakao, K. Tsujita, I. Arimoto, W. Wakamiya","doi":"10.1109/IMNC.2000.872611","DOIUrl":null,"url":null,"abstract":"It is revealed by optical image calculations that iso-focal tilt in phase edge lithography can be corrected by adjustment of primary spherical aberration. Tolerant range of the adjustment is /spl sim/0.02 wave. Moreover, DOF becomes larger than that in ideal optics under corrected spherical aberrations with large RMS-OPD of /spl sim/0.66 wave.","PeriodicalId":270640,"journal":{"name":"Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387)","volume":"49 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2000-07-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IMNC.2000.872611","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
It is revealed by optical image calculations that iso-focal tilt in phase edge lithography can be corrected by adjustment of primary spherical aberration. Tolerant range of the adjustment is /spl sim/0.02 wave. Moreover, DOF becomes larger than that in ideal optics under corrected spherical aberrations with large RMS-OPD of /spl sim/0.66 wave.
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