Oriented SnS thin films formed by nano-multilayer method

Zhan Xu, Yigang Chen, Wei-min Shi, Linjun Wang
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引用次数: 1

Abstract

Tin sulfide (SnS) thin films were prepared by nano-multilayer method on glass substrate followed by thermal annealing at 400 degrees for 3 hours in Argon atmosphere. The films showed strong (040) crystal orientation for the films with stoichiometric ratio (Sn:S) of 1:1. The film had an optical energy band gap Eg=1.44 ev and a P-type conductivity with a resistivity of 5 Ω•cm.
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纳米多层法制备取向SnS薄膜
采用纳米多层法制备了硫化锡(sn)薄膜,并在氩气气氛中400℃热处理3小时。当化学计量比(Sn:S)为1:1时,薄膜显示出很强的(040)晶体取向。薄膜的光能带隙Eg=1.44 ev,电导率为p型,电阻率为5 Ω•cm。
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