Lateral and vertical coupling effects in MIGFETs

S. Eminente, K. Na, S. Cristoloveanu, L. Mathew, A. Vandooren
{"title":"Lateral and vertical coupling effects in MIGFETs","authors":"S. Eminente, K. Na, S. Cristoloveanu, L. Mathew, A. Vandooren","doi":"10.1109/SOI.2005.1563548","DOIUrl":null,"url":null,"abstract":"We have performed measurements on double-gate Fin-FETs with independent gate contacts in order to study the coupling effects. In these devices, it is possible to separate the coupling between the two lateral channels and the coupling between one lateral channel and the back gate. The lateral coupling effect between the two gates is strong and can be used to tune the threshold voltage of the device whereas the vertical coupling is weaker and depends on the MIGFET size.","PeriodicalId":116606,"journal":{"name":"2005 IEEE International SOI Conference Proceedings","volume":"1974 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2005-12-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2005 IEEE International SOI Conference Proceedings","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SOI.2005.1563548","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 3

Abstract

We have performed measurements on double-gate Fin-FETs with independent gate contacts in order to study the coupling effects. In these devices, it is possible to separate the coupling between the two lateral channels and the coupling between one lateral channel and the back gate. The lateral coupling effect between the two gates is strong and can be used to tune the threshold voltage of the device whereas the vertical coupling is weaker and depends on the MIGFET size.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
migfet的横向和纵向耦合效应
为了研究耦合效应,我们对具有独立栅极触点的双栅鳍形场效应管进行了测量。在这些装置中,可以分离两个侧通道之间的耦合和一个侧通道与后门之间的耦合。两个栅极之间的横向耦合效应很强,可以用来调节器件的阈值电压,而垂直耦合较弱,取决于MIGFET的尺寸。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
The effect of integration of strontium-bismuth-tantalate capacitors onto SOI wafers A novel self-aligned substrate-diode structure for SOI technologies Development of stacking faults in strained silicon layers 3D via etch development for 3D circuit integration in FDSOI Stress technology impact on device performance and reliability for <100> sub-90nm SOI CMOSFETs
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1