Characterization of ultra-thin SOI MOSFETs by coupling effect between front and back interfaces

A. Ohata, S. Cristoioveanu, M. Cassé, A. Vandoorcn, F. Daugé
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引用次数: 4

Abstract

By investigating the coupling effect between the front and back channels of ultra-thin SOI-MOSFETs, the mobility enhancement by volume inversion, the channel separation between the front and back channels, and the impact of the SOI thickness are discussed. As a result, it is shown that a careful check is necessary for confirming which channel (front or back) is inverted in a short device because the channel separation is difficult in transconductance curves. Furthermore, it is shown that the SOI thickness depends on the device size and location, leading to a complex behavior.
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利用前后界面耦合效应表征超薄SOI mosfet
通过研究超薄SOI- mosfet的前后通道之间的耦合效应,讨论了体积反转对迁移率的增强、前后通道之间的通道分离以及SOI厚度的影响。结果表明,由于在跨导曲线中难以分离沟道,因此需要仔细检查以确定短器件中哪个沟道(前或后)是反转的。此外,SOI厚度取决于器件尺寸和位置,导致复杂的行为。
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