M. Iwamoto, C. Hutchinson, B. Luk, T. Low, D. D'Avanzo
{"title":"Characteristics of substrate-induced low frequency oscillations in GaAs HBT devices and circuits","authors":"M. Iwamoto, C. Hutchinson, B. Luk, T. Low, D. D'Avanzo","doi":"10.1109/CSICS.2017.8240441","DOIUrl":null,"url":null,"abstract":"Spurious oscillations in the low frequency region (below 100kHz) were investigated in InGaP/GaAs HBT devices and circuits. These low frequency oscillations (LFOs) are predominantly activated by the field across the semi-insulating GaAs substrate located between the subcollector and backside metal (of an emitter-up device). Several experiments were conducted to control and eliminate LFOs by floating the backside potential or applying a voltage to the backside metal. In both cases, the electric field across the GaAs substrate is minimized, thereby reducing the mechanism of the field-enhanced capture of electrons by traps in this region.","PeriodicalId":129729,"journal":{"name":"2017 IEEE Compound Semiconductor Integrated Circuit Symposium (CSICS)","volume":"13 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2017-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2017 IEEE Compound Semiconductor Integrated Circuit Symposium (CSICS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CSICS.2017.8240441","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Spurious oscillations in the low frequency region (below 100kHz) were investigated in InGaP/GaAs HBT devices and circuits. These low frequency oscillations (LFOs) are predominantly activated by the field across the semi-insulating GaAs substrate located between the subcollector and backside metal (of an emitter-up device). Several experiments were conducted to control and eliminate LFOs by floating the backside potential or applying a voltage to the backside metal. In both cases, the electric field across the GaAs substrate is minimized, thereby reducing the mechanism of the field-enhanced capture of electrons by traps in this region.