Profiling border-traps by TCAD analysis of multifrequency CV-curves in Al2O3/InGaAs stacks

E. Caruso, J. Lin, K. F. Burke, K. Cherkaoui, D. Esseni, F. Gity, S. Monaghan, P. Palestra, P. Hurley, L. Selmi
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引用次数: 4

Abstract

This paper reports physics based TCAD simulations of multi-frequency C-V curves of In0.53Ga0.47As MOSCAPs including the AC response of the border traps. The calculations reproduce the experimental inversion and accumulation capacitance versus frequency, and provide a means to profile the space and energy density of states of border traps. A sensitivity analysis of the results to border traps' distribution is carried out changing the trap volume and the oxide capacitance.
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Al2O3/InGaAs堆叠中多频cv曲线的TCAD分析
本文报道了基于物理的TCAD模拟In0.53Ga0.47As MOSCAPs的多频C-V曲线,包括边界陷阱的交流响应。计算重现了实验反演和累积电容随频率的变化,并提供了一种描述边界陷阱状态的空间和能量密度的方法。通过改变陷阱体积和氧化物电容,分析了结果对边界陷阱分布的敏感性。
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