Comparative BTI analysis for various sense amplifier designs

I. Agbo, M. Taouil, S. Hamdioui, P. Weckx, S. Cosemans, P. Raghavan, F. Catthoor
{"title":"Comparative BTI analysis for various sense amplifier designs","authors":"I. Agbo, M. Taouil, S. Hamdioui, P. Weckx, S. Cosemans, P. Raghavan, F. Catthoor","doi":"10.1109/DDECS.2016.7482438","DOIUrl":null,"url":null,"abstract":"With the continuous downscaling of CMOS technologies, ICs become more vulnerable to transistor aging mainly due to Bias Temperature Instability (BTI). This paper presents a comparative study of the BTI impact while considering varying supply voltages and temperatures for three memory sense amplifier (SA) designs: low power (LP), mid power/performance (MP), and high performance (HP). As an evaluation metric, the sensing delay (SD) of the three designs is analyzed for various workloads using 45nm technology. The results show that HP SA degrades faster than MP SA and LP SA irrespective of the workload, supply voltage, and temperature. At nominal supply voltage and temperature, HP degrades up to 1.62x faster than MP, and up to 1.94x faster than LP designs for the worst case workload. In addition, the results show that an increase of 10% in power supply has a marginal impact on the relative degradation. In contrast, the results show that a temperature increment significantly worsens the BTI impact. Finally, the results show that for 16nm technology, BTI impact becomes worse and even causes read failures. This clearly indicates that designing for reliability is not only strongly application dependent, but also technology node dependent. Hence, one has to carefully consider the targeted application, design, and technology node in order to provide appropriate solutions.","PeriodicalId":404733,"journal":{"name":"2016 IEEE 19th International Symposium on Design and Diagnostics of Electronic Circuits & Systems (DDECS)","volume":"24 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-04-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"8","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 IEEE 19th International Symposium on Design and Diagnostics of Electronic Circuits & Systems (DDECS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/DDECS.2016.7482438","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 8

Abstract

With the continuous downscaling of CMOS technologies, ICs become more vulnerable to transistor aging mainly due to Bias Temperature Instability (BTI). This paper presents a comparative study of the BTI impact while considering varying supply voltages and temperatures for three memory sense amplifier (SA) designs: low power (LP), mid power/performance (MP), and high performance (HP). As an evaluation metric, the sensing delay (SD) of the three designs is analyzed for various workloads using 45nm technology. The results show that HP SA degrades faster than MP SA and LP SA irrespective of the workload, supply voltage, and temperature. At nominal supply voltage and temperature, HP degrades up to 1.62x faster than MP, and up to 1.94x faster than LP designs for the worst case workload. In addition, the results show that an increase of 10% in power supply has a marginal impact on the relative degradation. In contrast, the results show that a temperature increment significantly worsens the BTI impact. Finally, the results show that for 16nm technology, BTI impact becomes worse and even causes read failures. This clearly indicates that designing for reliability is not only strongly application dependent, but also technology node dependent. Hence, one has to carefully consider the targeted application, design, and technology node in order to provide appropriate solutions.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
各种感测放大器设计的比较BTI分析
随着CMOS技术的不断缩小,ic越来越容易受到晶体管老化的影响,这主要是由于偏置温度不稳定性(BTI)。本文在考虑不同电源电压和温度的情况下,对三种存储器感测放大器(SA)设计:低功率(LP)、中功率/性能(MP)和高性能(HP)的BTI影响进行了比较研究。作为评估指标,分析了三种设计在使用45nm技术的不同工作负载下的传感延迟(SD)。结果表明,无论工作负载、电源电压和温度如何,HP SA的降解速度都快于MP SA和LP SA。在标称电源电压和温度下,在最坏的情况下,HP的退化速度比MP快1.62倍,比LP设计快1.94倍。此外,结果表明,增加10%的功率对相对退化有边际影响。相反,温度升高会显著加剧BTI的影响。最后,结果表明,对于16nm技术,BTI影响变得更糟,甚至导致读取失败。这清楚地表明,可靠性设计不仅具有很强的应用依赖性,而且具有技术节点依赖性。因此,必须仔细考虑目标应用程序、设计和技术节点,以便提供适当的解决方案。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Optical receivers in 0.35 μm BiCMOS for heterogeneous 3D integration A rule-based approach for minimizing power dissipation of digital circuits Early-stage verification of power-management specification in low-power systems design Integer-N phase locked loop for bluetooth receiver in CMOS 130 nm technology Gm-C filter with automatic calibration scheme
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1