W. Stanchina, R. Metzger, J. Jensen, D. Rensch, M. W. Pierce, M. Delaney, R. G. Wilson, T. V. Kargodorian, Y. K. Allen
{"title":"Improved high frequency performance of AlInAs/GaInAs HBTs through use of low temperature GaInAs","authors":"W. Stanchina, R. Metzger, J. Jensen, D. Rensch, M. W. Pierce, M. Delaney, R. G. Wilson, T. V. Kargodorian, Y. K. Allen","doi":"10.1109/ICIPRM.1990.202978","DOIUrl":null,"url":null,"abstract":"GaInAs grown at lower than normal substrate temperatures was used to reduce the amount of beryllium out-diffusion from the heavily doped bases of AlInAs/GaInAs Npn HBTs. A combined 20-nm-thick spacer structure of p-doped and undoped GaInAs grown at 300 degrees C prevented excessive amounts of beryllium from diffusing into the AlInAs emitter. This allowed base beryllium doping concentrations up to 10/sup 20/ cm/sup -3/ to be achieved, thereby reducing base resistance and increasing f/sub max/ to 70 GHz. A fifteen-stage ring oscillator utilizing these HBTs demonstrated a gate delay of 15.8 ps. The reduced outdiffusion was confirmed by secondary ion mass spectrometry (SIMS) elemental profiles in addition to electrical measurements.<<ETX>>","PeriodicalId":138960,"journal":{"name":"International Conference on Indium Phosphide and Related Materials","volume":"48 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1990-04-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"14","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Conference on Indium Phosphide and Related Materials","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICIPRM.1990.202978","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 14
Abstract
GaInAs grown at lower than normal substrate temperatures was used to reduce the amount of beryllium out-diffusion from the heavily doped bases of AlInAs/GaInAs Npn HBTs. A combined 20-nm-thick spacer structure of p-doped and undoped GaInAs grown at 300 degrees C prevented excessive amounts of beryllium from diffusing into the AlInAs emitter. This allowed base beryllium doping concentrations up to 10/sup 20/ cm/sup -3/ to be achieved, thereby reducing base resistance and increasing f/sub max/ to 70 GHz. A fifteen-stage ring oscillator utilizing these HBTs demonstrated a gate delay of 15.8 ps. The reduced outdiffusion was confirmed by secondary ion mass spectrometry (SIMS) elemental profiles in addition to electrical measurements.<>
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