Fabrication and DC current-voltage characteristics of real space transfer transistor with dual-quantum-well channel

Xin Yu, Shilin Zhang, L. Mao, Weilian Guo, Xiaoli Wang
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引用次数: 1

Abstract

We reported the standard ¿¿¿ shape negative differential resistance as well as a level and smooth valley region in real space transfer transistor (RSTT) with dual-quantum-well channel, which are formed by ¿-doping GaAs quantum-well and InGaAs/GaAs heterojunction quantum-well. The highest peak-to-valley current ratio (PVCR) of RSTT reaches 4 at room temperature. The highest peak current density transconductance (¿JP/¿VGS) is 130 ms/mm, which demonstrates the control ability of gate to JP. The mechanism of obvious NDR of RSTT can be explained that the hot electron in the InGaAs U-shaped quantum-well channel transfers into V-shaped ¿-doping GaAs quantum-well channel, and the hot electron transfers into gate electrode from V-shaped ¿-doping GaAs quantum-well channel. This novel NDR device would be expected to applied in NDR circuits to instead of RTD+HEMT.
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双量子阱通道实空间转移晶体管的制备及其直流电流-电压特性
本文报道了由掺杂GaAs量子阱和InGaAs/GaAs异质结量子阱形成的双量子阱通道的实空间转移晶体管(RSTT)的标准形状负差分电阻和平坦的谷区。室温下,RSTT的最高峰谷电流比(PVCR)达到4。最高峰值电流密度跨导(¿JP/¿VGS)为130 ms/mm,证明了栅极对JP的控制能力。RSTT发生明显NDR的机理可以解释为InGaAs u形量子阱中的热电子转移到v形掺杂GaAs量子阱中,热电子从v形掺杂GaAs量子阱转移到栅极中。这种新型的NDR器件有望在NDR电路中取代RTD+HEMT。
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