Investigation of optical proximity correction (OPC) and non-uniformities on the performance of resistivity and linewidth measurements

S. Smith, A. Walton, M. Fallon
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引用次数: 5

Abstract

The effect of optical proximity correction (OPC) on test structures is examined using DEPICT for the lithography simulation and MEDICI for the electrical calculations. It is concluded that OPC can be successfully used to reduce line shortening due to the voltage taps without causing necking effects on the track being measured. The effect of asymmetries (which may be introduced as a result of OPC) on the measurement of Greek crosses are also addressed and methods of accurately extracting sheet resistance from structures exhibiting these effects are discussed.
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光学接近校正(OPC)和非均匀性对电阻率和线宽测量性能的影响
光学接近校正(OPC)对测试结构的影响使用刻版模拟的描述和电气计算的MEDICI。结论是,OPC可以成功地用于减少由于电压抽头而导致的线路缩短,而不会对被测轨道产生颈缩效应。本文还讨论了不对称(可能是OPC的结果)对希腊十字架测量的影响,并讨论了从显示这些影响的结构中准确提取薄片电阻的方法。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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