An ESD protection scheme for deep sub-micron ULSI circuits

M. Sharma, J. Campbell, H. Choe, C. Kuo, E. Prinz, R. Raghunathan, P. Gardner, L. Avery
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引用次数: 4

Abstract

The paper describes a robust scheme for on-chip protection of sub-micron ULSI circuits against ESD stress using a novel (low voltage) zener-triggered SCR, and a zener-triggered thin gate oxide MOSFET. The devices are implemented in state of the art, 3.3 V, 0.5 /spl mu/m feature site dual-poly, full-SALICIDE technology. The trigger and holding voltages of the described ESD protection elements are tunable over wide operating ranges and the devices trigger consistently and predictably at pre-determined values suitable for sub-micron technologies. The effectiveness of this methodology in providing ESD protection up to 15 kV is successfully demonstrated.
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深亚微米ULSI电路的ESD保护方案
本文描述了一种利用新型(低电压)齐纳触发可控硅和齐纳触发薄栅氧化MOSFET对亚微米ULSI电路进行片上保护的鲁棒方案。这些器件采用最先进的3.3 V、0.5 /spl mu/m双聚、全salicide技术。所描述的ESD保护元件的触发电压和保持电压在宽工作范围内可调,并且器件在适合亚微米技术的预定值下一致且可预测地触发。该方法在提供高达15kv的ESD保护方面的有效性已被成功证明。
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