Scalable Logic Gate Non-Volatile Memory

Lee Wang, S. Hsu
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Abstract

Scalable Logic Gate Non-Volatile Memory (SLGNVM) devices fabricated with standard CMOS logic process have been demonstrated with 110 nm, 55 nm, and 40 nm nodes. The cell sizes for the NOR flash array complied with the process design rules of the CMOS logic nodes are 0.5424 μm2, 0.2287 μm2, and 0.1095 μm2, respectively. The SLGNVM devices have 3V ~ 5V program/erase windows with good data retention and endurance properties. The arrays of SLGNVM devices are suitable for embedded EEPROM and flash in digital circuitries, and for the new applications of non-volatile-SRAM (nvSRAM), Non-Volatile-Register (NVR), and non-volatile FPGA (nvFPGA).
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可扩展逻辑门非易失性存储器
采用标准CMOS逻辑工艺制备的可扩展逻辑门非易失性存储器(SLGNVM)器件已被证明具有110 nm, 55 nm和40 nm节点。符合CMOS逻辑节点工艺设计规则的NOR闪存阵列的单元尺寸分别为0.5424 μm2、0.2287 μm2和0.1095 μm2。SLGNVM器件具有3V ~ 5V的程序/擦除窗口,具有良好的数据保留和持久性能。SLGNVM器件阵列适用于数字电路中的嵌入式EEPROM和闪存,以及非易失性sram (nvSRAM)、非易失性寄存器(NVR)和非易失性FPGA (nvFPGA)等新应用。
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