Transport characteristics of optically-excited and electrically-injected minority electrons across p-Si/n-SiC hetero-interfaces

N. Shigekawa, S. Shimizu, Jianbo Liang, Masato Shingo, K. Shiojima, M. Arai
{"title":"Transport characteristics of optically-excited and electrically-injected minority electrons across p-Si/n-SiC hetero-interfaces","authors":"N. Shigekawa, S. Shimizu, Jianbo Liang, Masato Shingo, K. Shiojima, M. Arai","doi":"10.23919/LTB-3D.2017.7947422","DOIUrl":null,"url":null,"abstract":"We report on the photoresponse of p-Si/n-SiC heterojunctions and the electrical characteristics of SiC/Si hetero-junction bipolar transistors (HBTs), both of which are fabricated by bonding SiC and Si layers. We find that in the photoresponse measurements the square root of the quantum yield almost linearly depends on the photon energy and the absorption edge (1.2 v) is close to the bandgap of Si (1.12 eV), which implies that the achieved signal is attributed to the minority electrons optically excited in the p-Si layer and collected in the n-SiC layer across the hetero-interfaces. The characteristics of the SiC/Si HBTs reveal the common-base current gain α of « 0.9 for the base-collector bias voltage of 0 V at room temperature. These results indicate that SiC/Si hetero-interfaces are applicable for novel minority-carrier-based semiconductor devices.","PeriodicalId":183993,"journal":{"name":"2017 5th International Workshop on Low Temperature Bonding for 3D Integration (LTB-3D)","volume":"119 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2017-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2017 5th International Workshop on Low Temperature Bonding for 3D Integration (LTB-3D)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.23919/LTB-3D.2017.7947422","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

Abstract

We report on the photoresponse of p-Si/n-SiC heterojunctions and the electrical characteristics of SiC/Si hetero-junction bipolar transistors (HBTs), both of which are fabricated by bonding SiC and Si layers. We find that in the photoresponse measurements the square root of the quantum yield almost linearly depends on the photon energy and the absorption edge (1.2 v) is close to the bandgap of Si (1.12 eV), which implies that the achieved signal is attributed to the minority electrons optically excited in the p-Si layer and collected in the n-SiC layer across the hetero-interfaces. The characteristics of the SiC/Si HBTs reveal the common-base current gain α of « 0.9 for the base-collector bias voltage of 0 V at room temperature. These results indicate that SiC/Si hetero-interfaces are applicable for novel minority-carrier-based semiconductor devices.
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光激发和电注入少数电子在p-Si/n-SiC异质界面上的输运特性
我们报道了p-Si/n-SiC异质结的光响应和SiC/Si异质结双极晶体管(HBTs)的电学特性,这两种晶体管都是由SiC和Si层结合而成的。我们发现,在光响应测量中,量子产率的平方根几乎线性依赖于光子能量,并且吸收边(1.2 v)接近Si的带隙(1.12 eV),这意味着所获得的信号归因于在p-Si层中光激发的少数电子,并通过异质界面在n-SiC层中收集。在室温下,当基极-集电极偏置电压为0 V时,SiC/Si HBTs的共基极电流增益α为0.9。这些结果表明,SiC/Si异质界面可用于新型的少数载流子半导体器件。
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