Ge Photodiode with -3 dB OE Bandwidth of 110 GHz for PIC and ePIC Platforms

S. Lischke, A. Peczek, F. Korndörfer, C. Mai, H. Haisch, M. Koenigsmann, M. Rudisile, D. Steckler, F. Goetz, M. Fraschke, S. Marschmeyer, A. Krüger, Y. Yamamoto, D. Schmidt, U. Saarow, P. Heinrich, A. Kroh, M. Schubert, J. Katzer, P. Kulse, A. Trusch, L. Zimmermann
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引用次数: 8

Abstract

We present an SOI-waveguide coupled germanium photodiode with very high OE -3 dB bandwidth of ≥110 GHz at reverse bias of 2 V. This performance is achieved by a novel construction in that the germanium is sandwiched in between two in-situ doped silicon regions. This fabrication approach allows for avoiding ion-implantation into the germanium, which is certainly beneficial for the bandwidth as minority carrier diffusion effects are strongly suppressed. A responsivity of >0.6 A/W at 1550 nm (-2 V) is achieved, while the dark current of this device yields to about 300 nA (-2 V). To our knowledge, this is the most advanced germanium photo detector in terms of bandwidth combined with state-of-the-art responsivity as well as moderate dark currents. We demonstrate that the novel photodiodes can be fabricated with high yield.
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用于PIC和ePIC平台的-3 dB OE带宽为110 GHz的Ge光电二极管
我们提出了一种soi波导耦合锗光电二极管,在2v的反向偏置下,OE - 3db带宽非常高,≥110 GHz。这种性能是通过一种新颖的结构实现的,即锗被夹在两个原位掺杂硅区域之间。这种制造方法可以避免离子注入到锗中,这当然有利于带宽,因为少数载流子扩散效应被强烈抑制。该器件在1550 nm (-2 V)处的响应率为>.6 A/W,而暗电流约为300 nA (-2 V)。据我们所知,就带宽、最先进的响应率和中等暗电流而言,这是最先进的锗光探测器。我们证明了这种新型光电二极管可以高收率地制造出来。
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