P-contact MESFETs for high voltage mixed-mode RF-applications

P. Wennekers, P. Zdebel, M. Wilson, T. Bushey, B. Bernhard
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引用次数: 2

Abstract

MESFETs with P-well operating at higher drain voltage generate holes by impact ionization. They charge the GaAs substrate, give rise to increased output conductance and drain current transients at low temperature and facilitate inter-device coupling. Draining the holes by a P/sub +/-contact, which is attached to the source as an integral part of the device structure, neutralizes the adverse impact of holes on device performance. The improved MESFET is utilized in the digital section of a single-pole-eight-throw RF switch with integrated decoder.
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用于高压混合模式射频应用的p接触mesfet
在高漏极电压下工作的p阱mesfet通过冲击电离产生空穴。它们给砷化镓衬底充电,在低温下增加输出电导和漏电流瞬态,并促进器件间耦合。通过P/sub +/-触点(作为器件结构的组成部分附在电源上)排出孔,可以抵消孔对器件性能的不利影响。改进的MESFET用于集成解码器的单极八掷射频开关的数字部分。
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Ion-implanted GaAs JFETs with f/sub t/>45 GHz for low-power electronics W-band InGaAs/InP PIN diode monolithic integrated switches A 500 MHz complementary gallium arsenide clock multiplier A 2 GHz 12-bit digital-to-analog converter for direct digital synthesis applications Breakdown effects on the performance and reliability of power MESFETs
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