首页 > 最新文献

GaAs IC Symposium IEEE Gallium Arsenide Integrated Circuit Symposium. 18th Annual Technical Digest 1996最新文献

英文 中文
Ion-implanted GaAs JFETs with f/sub t/>45 GHz for low-power electronics 用于低功耗电子器件的f/sub />45 GHz离子注入GaAs jfet
J. Zolper, A. Baca, M. Sherwin, V. Hietala, J. Shul
GaAs Junction Field Effect Transistors (JFETs) are reported with gate lengths down to 0.3 /spl mu/m. The structure is fully self-aligned and employs all ion implantation doping. p/sup +/-gate regions are formed with either Zn or Cd implants along with a P co-implantation to reduce diffusion. The source and drain implants are engineered with Si or SiF implants to minimize short channel effects. 0.3 /spl mu/m gate length JFETs are demonstrated with a subthreshold slope of 110 mV/decade along with an intrinsic unity current gain cutoff frequency as high as 52 GHz.
据报道,GaAs结场效应晶体管(jfet)的栅极长度低至0.3 /spl mu/m。该结构是完全自对准的,采用全离子注入掺杂。p/sup +/-栅极区是由Zn或Cd注入和p共注入形成的,以减少扩散。源极和漏极植入物采用Si或SiF植入物设计,以尽量减少短通道效应。0.3 /spl mu/m栅极长度的jfet的亚阈值斜率为110 mV/decade,固有的单位电流增益截止频率高达52 GHz。
{"title":"Ion-implanted GaAs JFETs with f/sub t/>45 GHz for low-power electronics","authors":"J. Zolper, A. Baca, M. Sherwin, V. Hietala, J. Shul","doi":"10.1109/GAAS.1996.567836","DOIUrl":"https://doi.org/10.1109/GAAS.1996.567836","url":null,"abstract":"GaAs Junction Field Effect Transistors (JFETs) are reported with gate lengths down to 0.3 /spl mu/m. The structure is fully self-aligned and employs all ion implantation doping. p/sup +/-gate regions are formed with either Zn or Cd implants along with a P co-implantation to reduce diffusion. The source and drain implants are engineered with Si or SiF implants to minimize short channel effects. 0.3 /spl mu/m gate length JFETs are demonstrated with a subthreshold slope of 110 mV/decade along with an intrinsic unity current gain cutoff frequency as high as 52 GHz.","PeriodicalId":365997,"journal":{"name":"GaAs IC Symposium IEEE Gallium Arsenide Integrated Circuit Symposium. 18th Annual Technical Digest 1996","volume":"53 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1996-12-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130444970","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
A GaAs HEMT MMIC chip set for automotive radar systems fabricated by optical stepper lithography 采用光学步进光刻技术制备汽车雷达系统用GaAs HEMT MMIC芯片
J. Muller, A. Bangert, T. Grave, M. Karner, H. Riechert, A. Schafer, H. Siweris, L. Schleicher, H. Tischer, L. Verweyen, W. Kellner, T. Meier
A production oriented GaAs HEMT MMIC chipset for a 77 GHz FMCW automotive radar system is reported. It differs mainly in two aspects from the GaAs MMIC solutions described earlier: (1) 0.12 /spl mu/m gatelength PHEMTs are fabricated by optical stepper lithography, (2) a coplanar design is used. A fully passivated PHEMT fabrication process is reported with current-gain and power-gain cutoff frequencies exceeding 115 and 220 GHz, respectively. The design and performance of the chipset consisting of four different MMICs (VCO, harmonic mixer, transmitter, receiver) is described. The great potential of this MMIC approach to meet all system requirements of an automotive radar sensor in a cost effective and production oriented way is shown.
报道了一种用于77 GHz FMCW汽车雷达系统的GaAs HEMT MMIC芯片组。它与前面描述的GaAs MMIC解决方案主要在两个方面不同:(1)采用光学步进光刻技术制造0.12 /spl mu/m栅极长度phemt;(2)采用共面设计。报道了一种完全钝化的PHEMT制造工艺,其电流增益和功率增益截止频率分别超过115 GHz和220 GHz。介绍了由四个不同的mmic (VCO、谐波混频器、发射机、接收机)组成的芯片组的设计和性能。这种MMIC方法具有巨大的潜力,可以满足汽车雷达传感器的所有系统要求,并且具有成本效益和面向生产的方式。
{"title":"A GaAs HEMT MMIC chip set for automotive radar systems fabricated by optical stepper lithography","authors":"J. Muller, A. Bangert, T. Grave, M. Karner, H. Riechert, A. Schafer, H. Siweris, L. Schleicher, H. Tischer, L. Verweyen, W. Kellner, T. Meier","doi":"10.1109/gaas.1996.567866","DOIUrl":"https://doi.org/10.1109/gaas.1996.567866","url":null,"abstract":"A production oriented GaAs HEMT MMIC chipset for a 77 GHz FMCW automotive radar system is reported. It differs mainly in two aspects from the GaAs MMIC solutions described earlier: (1) 0.12 /spl mu/m gatelength PHEMTs are fabricated by optical stepper lithography, (2) a coplanar design is used. A fully passivated PHEMT fabrication process is reported with current-gain and power-gain cutoff frequencies exceeding 115 and 220 GHz, respectively. The design and performance of the chipset consisting of four different MMICs (VCO, harmonic mixer, transmitter, receiver) is described. The great potential of this MMIC approach to meet all system requirements of an automotive radar sensor in a cost effective and production oriented way is shown.","PeriodicalId":365997,"journal":{"name":"GaAs IC Symposium IEEE Gallium Arsenide Integrated Circuit Symposium. 18th Annual Technical Digest 1996","volume":"30 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1996-11-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127202094","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 15
A completely integrated single-chip phase-locked loop with a 15 GHz VCO using 0.2 /spl mu/m E-/D-HEMT-technology 完全集成的单芯片锁相环,采用0.2 /spl mu/m E-/ d - hemt技术,具有15 GHz VCO
P. Leber, W. Baumberger, M. Lang, M. Rieger-Motzer, W. Bronner, A. Hulsmann, B. Raynor
A completely integrated single-chip phase-locked loop was designed using a 0.2 /spl mu/m-enhancement/depletion AlGaAs/GaAs/AlGaAs-HEMT technology. The chip contains a VCO with 15 GHz center frequency, as well as a frequency divider, a phase detector, and a loop filter. The fabricated chip size is 1.5/spl times/1.5 mm/sup 2/. The power consumption is 0.5 W using a supply voltage of 5.0 V. The lock range is approximately /spl plusmn/270 MHz. The phase noise is -100 dBc/Hz at 100 kHz and -107 dBc/Hz at 1 MHz offset from the carrier, respectively.
采用0.2 /spl mu/m增强/耗尽AlGaAs/GaAs/AlGaAs- hemt技术设计了完全集成的单片机锁相环。该芯片包含一个中心频率为15ghz的压控振荡器,以及分频器、鉴相器和环路滤波器。所制芯片尺寸为1.5/ sp1倍/1.5 mm/sup 2/。电源电压为5.0 V时,功耗为0.5 W。锁定范围约为/spl plusmn/270 MHz。相位噪声在100khz时为- 100dbc /Hz,在偏离载波1mhz时为-107 dBc/Hz。
{"title":"A completely integrated single-chip phase-locked loop with a 15 GHz VCO using 0.2 /spl mu/m E-/D-HEMT-technology","authors":"P. Leber, W. Baumberger, M. Lang, M. Rieger-Motzer, W. Bronner, A. Hulsmann, B. Raynor","doi":"10.1109/GAAS.1996.567744","DOIUrl":"https://doi.org/10.1109/GAAS.1996.567744","url":null,"abstract":"A completely integrated single-chip phase-locked loop was designed using a 0.2 /spl mu/m-enhancement/depletion AlGaAs/GaAs/AlGaAs-HEMT technology. The chip contains a VCO with 15 GHz center frequency, as well as a frequency divider, a phase detector, and a loop filter. The fabricated chip size is 1.5/spl times/1.5 mm/sup 2/. The power consumption is 0.5 W using a supply voltage of 5.0 V. The lock range is approximately /spl plusmn/270 MHz. The phase noise is -100 dBc/Hz at 100 kHz and -107 dBc/Hz at 1 MHz offset from the carrier, respectively.","PeriodicalId":365997,"journal":{"name":"GaAs IC Symposium IEEE Gallium Arsenide Integrated Circuit Symposium. 18th Annual Technical Digest 1996","volume":"48 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1996-11-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123298331","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 5
A high efficiency 0.15 /spl mu/m 2-mil thick InGaAs/AlGaAs/GaAs V-band power HEMT MMIC 一个高效率的0.15 /spl mu/m 2 mil厚InGaAs/AlGaAs/GaAs v波段功率HEMT MMIC
R. Lai, M. Nishimoto, Y. Hwang, M. Biedenbender, B. Kasody, C. Geiger, Y.C. Chen, G. Zell
We present a unique high performance 0.15 /spl mu/m InGaAs/AlGaAs/GaAs HEMT MMIC power amplifier fabricated with a 2-mil thick GaAs substrate which operates at V-band. The 2-stage 59-64 GHz power MMIC amplifier exhibits 27% peak power added efficiency at 60 GHz with 275 mW output power (350 mW/mm) and 11 dB power gain. When biased for higher output power, 400 mW output power was achieved at 60 GHz with 24.5% power added efficiency. This is the highest reported combination of output power and power added efficiency reported to date at this frequency band. This amplifier also exhibits outstanding wideband power characteristics with 25.5/spl plusmn/0.5 dBm output power measured from 59-64 GHz.
我们提出了一种独特的高性能0.15 /spl mu/m InGaAs/AlGaAs/GaAs HEMT MMIC功率放大器,该功率放大器采用2 mil厚的GaAs衬底制成,工作在v波段。2级59-64 GHz功率MMIC放大器在60 GHz时具有27%的峰值功率增加效率,输出功率为275 mW (350 mW/mm),功率增益为11 dB。当偏置更高的输出功率时,在60 GHz下可获得400 mW输出功率,功率增加效率为24.5%。这是迄今为止在该频段报道的输出功率和功率附加效率的最高组合。该放大器还具有出色的宽带功率特性,在59-64 GHz范围内具有25.5/spl plusmn/0.5 dBm输出功率。
{"title":"A high efficiency 0.15 /spl mu/m 2-mil thick InGaAs/AlGaAs/GaAs V-band power HEMT MMIC","authors":"R. Lai, M. Nishimoto, Y. Hwang, M. Biedenbender, B. Kasody, C. Geiger, Y.C. Chen, G. Zell","doi":"10.1109/GAAS.1996.567874","DOIUrl":"https://doi.org/10.1109/GAAS.1996.567874","url":null,"abstract":"We present a unique high performance 0.15 /spl mu/m InGaAs/AlGaAs/GaAs HEMT MMIC power amplifier fabricated with a 2-mil thick GaAs substrate which operates at V-band. The 2-stage 59-64 GHz power MMIC amplifier exhibits 27% peak power added efficiency at 60 GHz with 275 mW output power (350 mW/mm) and 11 dB power gain. When biased for higher output power, 400 mW output power was achieved at 60 GHz with 24.5% power added efficiency. This is the highest reported combination of output power and power added efficiency reported to date at this frequency band. This amplifier also exhibits outstanding wideband power characteristics with 25.5/spl plusmn/0.5 dBm output power measured from 59-64 GHz.","PeriodicalId":365997,"journal":{"name":"GaAs IC Symposium IEEE Gallium Arsenide Integrated Circuit Symposium. 18th Annual Technical Digest 1996","volume":"70 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1996-11-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128689754","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 27
Soft error immune LT GaAs ICs 软误差免疫LT GaAs集成电路
T. Weatherford, P. Marshall, C. Dale, D. McMorrow, A. Peczalski, S. Baier, M. Carts, M. Twigg
Implementation of a low temperature grown GaAs (LT GaAs) buffer layer beneath the complementary heterostructure field effect transistor (CHFET) GaAs integrated circuit (IC) process is shown to eliminate soft error susceptibility. With soft errors reduced by over 8 orders of magnitude, the CHFET digital GaAs technology can provide the highest overall radiation immunity for any GaAs or silicon FET-based technology.
在互补异质结构场效应晶体管(CHFET) GaAs集成电路(IC)工艺下实现低温生长GaAs (LT GaAs)缓冲层可以消除软误差敏感性。由于软误差降低了8个数量级以上,CHFET数字GaAs技术可以为任何GaAs或硅fet技术提供最高的整体抗辐射能力。
{"title":"Soft error immune LT GaAs ICs","authors":"T. Weatherford, P. Marshall, C. Dale, D. McMorrow, A. Peczalski, S. Baier, M. Carts, M. Twigg","doi":"10.1109/GAAS.1996.567901","DOIUrl":"https://doi.org/10.1109/GAAS.1996.567901","url":null,"abstract":"Implementation of a low temperature grown GaAs (LT GaAs) buffer layer beneath the complementary heterostructure field effect transistor (CHFET) GaAs integrated circuit (IC) process is shown to eliminate soft error susceptibility. With soft errors reduced by over 8 orders of magnitude, the CHFET digital GaAs technology can provide the highest overall radiation immunity for any GaAs or silicon FET-based technology.","PeriodicalId":365997,"journal":{"name":"GaAs IC Symposium IEEE Gallium Arsenide Integrated Circuit Symposium. 18th Annual Technical Digest 1996","volume":"30 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1996-11-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130084521","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Low current wideband amplifier using 0.2 /spl mu/m gate MODFET fabricated by using phase-shift lithography 采用移相光刻技术制作0.2 /spl μ m栅极MODFET的低电流宽带放大器
I. Ishida, K. Miyatsuji, T. Tanaka, H. Takenaka, H. Furukawa, M. Nishitsuji, A. Tamura, D. Ueda
We have developed wideband amplifier that can keep over 10 dB gain at the drain voltage/current of 2 V/10 mA in the frequency range from 100 MHz to 3 GHz. The fabricated IC achieved low noise figure and high IP3 (output) of 1.4 dB and 30 dBm at 800 MHz, respectively. The present IC employs 0.2 /spl mu/m gate delta-doped MODFET structure fabricated by using phase-shift lithography.
我们开发了一种宽带放大器,可以在100 MHz至3 GHz的频率范围内,在2 V/10 mA的漏极电压/电流下保持10 dB以上的增益。该集成电路在800 MHz时的低噪声系数和高IP3(输出)分别为1.4 dB和30 dBm。本集成电路采用移相光刻技术制备0.2 /spl μ m栅极掺杂MODFET结构。
{"title":"Low current wideband amplifier using 0.2 /spl mu/m gate MODFET fabricated by using phase-shift lithography","authors":"I. Ishida, K. Miyatsuji, T. Tanaka, H. Takenaka, H. Furukawa, M. Nishitsuji, A. Tamura, D. Ueda","doi":"10.1109/GAAS.1996.567880","DOIUrl":"https://doi.org/10.1109/GAAS.1996.567880","url":null,"abstract":"We have developed wideband amplifier that can keep over 10 dB gain at the drain voltage/current of 2 V/10 mA in the frequency range from 100 MHz to 3 GHz. The fabricated IC achieved low noise figure and high IP3 (output) of 1.4 dB and 30 dBm at 800 MHz, respectively. The present IC employs 0.2 /spl mu/m gate delta-doped MODFET structure fabricated by using phase-shift lithography.","PeriodicalId":365997,"journal":{"name":"GaAs IC Symposium IEEE Gallium Arsenide Integrated Circuit Symposium. 18th Annual Technical Digest 1996","volume":"23 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1996-11-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131531015","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Direct observation of localized high current effects in gallium arsenide field effect transistors 砷化镓场效应晶体管局部大电流效应的直接观察
M. P. Dugan
High power GaAs integrated circuits operated at elevated temperatures display failure mechanisms which result from the high current densities through the FETs. Evidence of material growths or material accumulations on the drain contacts of high current FETs has been observed after the GaAs substrate material has been removed by chemical etching. These observations support the conclusion that these growths are responsible for end-of-life failures in the high current FETs.
在高温下工作的大功率GaAs集成电路显示出由通过fet的高电流密度导致的失效机制。在化学蚀刻去除GaAs衬底材料后,观察到在高电流场效应管的漏极触点上有物质生长或物质积累的证据。这些观察结果支持这样的结论,即这些生长是导致高电流场效应管寿命终止失效的原因。
{"title":"Direct observation of localized high current effects in gallium arsenide field effect transistors","authors":"M. P. Dugan","doi":"10.1109/GAAS.1996.567632","DOIUrl":"https://doi.org/10.1109/GAAS.1996.567632","url":null,"abstract":"High power GaAs integrated circuits operated at elevated temperatures display failure mechanisms which result from the high current densities through the FETs. Evidence of material growths or material accumulations on the drain contacts of high current FETs has been observed after the GaAs substrate material has been removed by chemical etching. These observations support the conclusion that these growths are responsible for end-of-life failures in the high current FETs.","PeriodicalId":365997,"journal":{"name":"GaAs IC Symposium IEEE Gallium Arsenide Integrated Circuit Symposium. 18th Annual Technical Digest 1996","volume":"14 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1996-11-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132849307","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
GaAs VLSI implementation of a 2.5 Gb/s ATM label translator GaAs VLSI实现的2.5 Gb/s ATM标签转换器
I. Moussa, P. Lassen
Routing tables for communication networks can be designed using several approaches, including table look-up, content-addressable Memory (CAM), hashing, and tries. This paper presents a GaAs VLSI implementation of an efficient table lookup algorithm for 2.5 Gb/s ATM switching systems. This algorithm presents some very promising features such as the number of Virtual Channels which can reach 30000 possible connections. An extra header of three bytes is attached to the cell header which contains policing and priorities information for use inside the switch. Routing information is performed by using the Virtual Path Identifier (VPI) and the Virtual Channel Identifier (VCI) in the incoming cell to access the header translation table. The VLSI chip is fabricated using 0.6 /spl mu/m gate GaAs MESFETs, by VITESSE Semiconductor and it is housed in a 132 pin LDCC package. The Label Translator chip is expected to operate at 311 MHz with an associated power dissipation of 4 W.
可以使用几种方法设计通信网络的路由表,包括表查找、内容可寻址内存(CAM)、散列和尝试。本文提出了一种用于2.5 Gb/s ATM交换系统的高效表查找算法的GaAs VLSI实现。该算法呈现出一些非常有前景的特性,例如虚拟通道的数量可以达到30000个可能的连接。一个额外的三个字节的报头附加到单元报头,其中包含用于交换机内部的警务和优先级信息。路由信息通过使用传入单元中的虚拟路径标识符(VPI)和虚拟通道标识符(VCI)来访问报头转换表来执行。该VLSI芯片采用VITESSE半导体的0.6 /spl μ /m栅极GaAs mesfet制造,并封装在132引脚LDCC封装中。Label Translator芯片预计工作频率为311 MHz,相关功耗为4w。
{"title":"GaAs VLSI implementation of a 2.5 Gb/s ATM label translator","authors":"I. Moussa, P. Lassen","doi":"10.1109/GAAS.1996.567649","DOIUrl":"https://doi.org/10.1109/GAAS.1996.567649","url":null,"abstract":"Routing tables for communication networks can be designed using several approaches, including table look-up, content-addressable Memory (CAM), hashing, and tries. This paper presents a GaAs VLSI implementation of an efficient table lookup algorithm for 2.5 Gb/s ATM switching systems. This algorithm presents some very promising features such as the number of Virtual Channels which can reach 30000 possible connections. An extra header of three bytes is attached to the cell header which contains policing and priorities information for use inside the switch. Routing information is performed by using the Virtual Path Identifier (VPI) and the Virtual Channel Identifier (VCI) in the incoming cell to access the header translation table. The VLSI chip is fabricated using 0.6 /spl mu/m gate GaAs MESFETs, by VITESSE Semiconductor and it is housed in a 132 pin LDCC package. The Label Translator chip is expected to operate at 311 MHz with an associated power dissipation of 4 W.","PeriodicalId":365997,"journal":{"name":"GaAs IC Symposium IEEE Gallium Arsenide Integrated Circuit Symposium. 18th Annual Technical Digest 1996","volume":"72 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1996-11-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128918763","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Highly integrated 3-D MMIC technology being applied to novel masterslice GaAs- and Si-MMIC's 高度集成的3-D MMIC技术被应用于新型晶片GaAs和Si-MMIC
T. Tokumitsu, M. Hirano, K. Yamasaki, C. Yamaguchi, M. Aikawa
A novel masterslice MMIC design approach employing a 3-D MMIC structure is described using a highly-integrated 17-24 GHz GaAs single-chip receiver and a 7-10 GHz Si reactive-impedance-matching amplifier, which are the most recent devices fabricated with our process. This approach considerably reduces TAT and manufacturing costs.
采用高集成的17-24 GHz GaAs单芯片接收器和7-10 GHz Si无功阻抗匹配放大器,描述了一种采用三维MMIC结构的新型主片MMIC设计方法,这是我们最新制造的器件。这种方法大大降低了TAT和制造成本。
{"title":"Highly integrated 3-D MMIC technology being applied to novel masterslice GaAs- and Si-MMIC's","authors":"T. Tokumitsu, M. Hirano, K. Yamasaki, C. Yamaguchi, M. Aikawa","doi":"10.1109/GAAS.1996.567833","DOIUrl":"https://doi.org/10.1109/GAAS.1996.567833","url":null,"abstract":"A novel masterslice MMIC design approach employing a 3-D MMIC structure is described using a highly-integrated 17-24 GHz GaAs single-chip receiver and a 7-10 GHz Si reactive-impedance-matching amplifier, which are the most recent devices fabricated with our process. This approach considerably reduces TAT and manufacturing costs.","PeriodicalId":365997,"journal":{"name":"GaAs IC Symposium IEEE Gallium Arsenide Integrated Circuit Symposium. 18th Annual Technical Digest 1996","volume":"3 3 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1996-11-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128303558","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 12
A monolithic integrated HEMT-HBT S-band receiver 单片集成HEMT-HBT s波段接收机
K. Kobayashi, A. Oki, D. Umemoto, T. Block, D. Streit
Here we report on the world's first monolithically integrated HEMT-HBT MMIC receiver. The S-band receiver MMIC is the first of its kind, integrating a 2-stage HEMT LNA RF amplifier and a HEMT LO amplifier with an HBT double-balanced Gilbert cell mixer using selective MBE. The MMIC achieves greater than 18 dB conversion gain over an RF input band from 1.4-2.6 GHz, a minimum DSB noise figure of 2.3 dB and an IF3 of -0.5 dBm with no IF amplification. In addition, LO-IF and RF-IF isolations in excess of 22 dB and a 2-2 Spur suppression of 40 dBc are obtained due to the use of the double balanced HBT Gilbert cell mixer. The compact MMIC is 7.7/spl times/2.9 mm/sup 2/ and is self-biased from /spl plusmn/5 V supplies with a total dc power consumption of 735 mW. This HEMT-HBT MMIC represents the highest complexity design achieved using the HEMT-HBT selective MBE IC technology and demonstrates size and RF performance advantages over single-technology MMIC and hybrid integrated approaches.
在这里,我们报告了世界上第一个单片集成HEMT-HBT MMIC接收器。s波段接收器MMIC是同类产品中的首款,集成了一个2级HEMT LNA RF放大器和一个HEMT LO放大器,以及一个使用选择性MBE的HBT双平衡吉尔伯特小区混频器。在无中频放大的情况下,MMIC在1.4-2.6 GHz的射频输入频段内实现了大于18 dB的转换增益,最小DSB噪声系数为2.3 dB, IF3为-0.5 dBm。此外,由于使用双平衡HBT吉尔伯特单元混频器,获得了超过22 dB的LO-IF和RF-IF隔离和40 dBc的2-2杂散抑制。紧凑的MMIC为7.7/spl倍/2.9 mm/sup 2/,自偏置/spl plusmn/5 V电源,总直流功耗为735 mW。这款HEMT-HBT MMIC代表了使用HEMT-HBT选择性MBE IC技术实现的最高复杂性设计,并展示了比单技术MMIC和混合集成方法更大的尺寸和RF性能优势。
{"title":"A monolithic integrated HEMT-HBT S-band receiver","authors":"K. Kobayashi, A. Oki, D. Umemoto, T. Block, D. Streit","doi":"10.1109/GAAS.1996.567868","DOIUrl":"https://doi.org/10.1109/GAAS.1996.567868","url":null,"abstract":"Here we report on the world's first monolithically integrated HEMT-HBT MMIC receiver. The S-band receiver MMIC is the first of its kind, integrating a 2-stage HEMT LNA RF amplifier and a HEMT LO amplifier with an HBT double-balanced Gilbert cell mixer using selective MBE. The MMIC achieves greater than 18 dB conversion gain over an RF input band from 1.4-2.6 GHz, a minimum DSB noise figure of 2.3 dB and an IF3 of -0.5 dBm with no IF amplification. In addition, LO-IF and RF-IF isolations in excess of 22 dB and a 2-2 Spur suppression of 40 dBc are obtained due to the use of the double balanced HBT Gilbert cell mixer. The compact MMIC is 7.7/spl times/2.9 mm/sup 2/ and is self-biased from /spl plusmn/5 V supplies with a total dc power consumption of 735 mW. This HEMT-HBT MMIC represents the highest complexity design achieved using the HEMT-HBT selective MBE IC technology and demonstrates size and RF performance advantages over single-technology MMIC and hybrid integrated approaches.","PeriodicalId":365997,"journal":{"name":"GaAs IC Symposium IEEE Gallium Arsenide Integrated Circuit Symposium. 18th Annual Technical Digest 1996","volume":"69 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1996-11-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127255427","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 7
期刊
GaAs IC Symposium IEEE Gallium Arsenide Integrated Circuit Symposium. 18th Annual Technical Digest 1996
全部 Acc. Chem. Res. ACS Applied Bio Materials ACS Appl. Electron. Mater. ACS Appl. Energy Mater. ACS Appl. Mater. Interfaces ACS Appl. Nano Mater. ACS Appl. Polym. Mater. ACS BIOMATER-SCI ENG ACS Catal. ACS Cent. Sci. ACS Chem. Biol. ACS Chemical Health & Safety ACS Chem. Neurosci. ACS Comb. Sci. ACS Earth Space Chem. ACS Energy Lett. ACS Infect. Dis. ACS Macro Lett. ACS Mater. Lett. ACS Med. Chem. Lett. ACS Nano ACS Omega ACS Photonics ACS Sens. ACS Sustainable Chem. Eng. ACS Synth. Biol. Anal. Chem. BIOCHEMISTRY-US Bioconjugate Chem. BIOMACROMOLECULES Chem. Res. Toxicol. Chem. Rev. Chem. Mater. CRYST GROWTH DES ENERG FUEL Environ. Sci. Technol. Environ. Sci. Technol. Lett. Eur. J. Inorg. Chem. IND ENG CHEM RES Inorg. Chem. J. Agric. Food. Chem. J. Chem. Eng. Data J. Chem. Educ. J. Chem. Inf. Model. J. Chem. Theory Comput. J. Med. Chem. J. Nat. Prod. J PROTEOME RES J. Am. Chem. Soc. LANGMUIR MACROMOLECULES Mol. Pharmaceutics Nano Lett. Org. Lett. ORG PROCESS RES DEV ORGANOMETALLICS J. Org. Chem. J. Phys. Chem. J. Phys. Chem. A J. Phys. Chem. B J. Phys. Chem. C J. Phys. Chem. Lett. Analyst Anal. Methods Biomater. Sci. Catal. Sci. Technol. Chem. Commun. Chem. Soc. Rev. CHEM EDUC RES PRACT CRYSTENGCOMM Dalton Trans. Energy Environ. Sci. ENVIRON SCI-NANO ENVIRON SCI-PROC IMP ENVIRON SCI-WAT RES Faraday Discuss. Food Funct. Green Chem. Inorg. Chem. Front. Integr. Biol. J. Anal. At. Spectrom. J. Mater. Chem. A J. Mater. Chem. B J. Mater. Chem. C Lab Chip Mater. Chem. Front. Mater. Horiz. MEDCHEMCOMM Metallomics Mol. Biosyst. Mol. Syst. Des. Eng. Nanoscale Nanoscale Horiz. Nat. Prod. Rep. New J. Chem. Org. Biomol. Chem. Org. Chem. Front. PHOTOCH PHOTOBIO SCI PCCP Polym. Chem.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1