{"title":"Hub-centered production control of wafer fabrication","authors":"S. Lou, H. Yan, S. Sethi, A. Gardel, P. Deosthali","doi":"10.1109/ASMC.1990.111216","DOIUrl":null,"url":null,"abstract":"A flow-rate control policy to manage the production of a wafer fabrication facility is described. The policy is derived by formulating and solving a stochastic control problem. The results are then used to develop two sets of production control rules. The first one adjusts the lot release by determining when and how many new lots should be started. The second one controls the reentrant process in the photolithography area, commonly known as the hub. The control rules are robust against random disturbances because they provide a feedback control based on the information of the entire shop floor.<<ETX>>","PeriodicalId":158760,"journal":{"name":"IEEE/SEMI Conference on Advanced Semiconductor Manufacturing Workshop","volume":"132 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1990-09-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"17","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE/SEMI Conference on Advanced Semiconductor Manufacturing Workshop","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ASMC.1990.111216","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 17
Abstract
A flow-rate control policy to manage the production of a wafer fabrication facility is described. The policy is derived by formulating and solving a stochastic control problem. The results are then used to develop two sets of production control rules. The first one adjusts the lot release by determining when and how many new lots should be started. The second one controls the reentrant process in the photolithography area, commonly known as the hub. The control rules are robust against random disturbances because they provide a feedback control based on the information of the entire shop floor.<>
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